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Merck
CN

205184

Hexachlorodisilane

96%

Synonym(s):

1,1,1,2,2,2-Hexachlorodisilane, Disilicon hexachloride, HCDS

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About This Item

Linear Formula:
(SiCl3)2
CAS Number:
13465-77-5
Molecular Weight:
268.89
NACRES:
NA.23
PubChem Substance ID:
24852311
UNSPSC Code:
12352103
EC Number:
236-704-1
MDL number:
MFCD00011599

Key Documents

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Product Name

Hexachlorodisilane, 96%

InChI key

LXEXBJXDGVGRAR-UHFFFAOYSA-N

InChI

1S/Cl6Si2/c1-7(2,3)8(4,5)6

SMILES string

Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl

assay

96%

form

liquid

refractive index

n20/D 1.475 (lit.)

bp

144-145.5 °C (lit.)

density

1.562 g/mL at 25 °C (lit.)

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General description

Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films.

Application

HCDS can be used in the fabrication of silica aerogels by chemical vapor deposition (CVD), which can be potentially used as encapsulating agents and thermal insulators. It can also be used to synthesize 1,1,1,2,2,2-hexaamino-disilanes using CVD, which forms silicon-based films for microelectronic-based applications.
HCDS may be used as a reducing agent. It may be combined with ammonia to form silicon nitride by chemical vapor deposition(CVD) technique.

pictograms

Corrosion
GHS05

signalword

Danger

hcodes

H314

Hazard Classifications

Skin Corr. 1B

supp_hazards

EUH014

Storage Class

8A - Combustible corrosive hazardous materials

wgk

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

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Certificates of Analysis (COA)

Lot/Batch Number
SHBL6986
SHBL7092
MKBF7180V
63896CK
47596PJ

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Initial Reaction of Hexachlorodisilane on Amorphous Silica Surface for Atomic Layer Deposition Using Density Functional Theory.
Kim K, et al.
Journal of the Korean Ceramic Society, 54(5), 443-447 (2017)
Enhancing mechanical properties of silica aerogels.
Obrey KAD, et al.
Journal of Non-Crystalline Solids, 357(19-20), 3435-3441 (2011)
Use of hexachlorodisilane as a reducing agent. Stereospecific deoxygenation of acyclic phosphine oxides.
Naumann K, et al.
Journal of the American Chemical Society, 91(25), 7012-7023 (1969)
The Research about Preparation of High Purity Hexachlorodisilane.
IOP Conference Series: Materials Science and Engineering, 274(1), 012125-012125 (2017)
A family of 1, 1, 1, 2, 2, 2-hexa (-primary-) amino-disilanes as potential CVD precursors: Tuning thermal properties by small variation of the substituent.
Du L, et al.
Polyhedron, 117(5), 729-734 (2016)
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