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About This Item
Linear Formula:
(CH3)3SiC≡CH
CAS Number:
Molecular Weight:
98.22
UNSPSC Code:
12352100
NACRES:
NA.22
PubChem Substance ID:
MDL number:
Beilstein/REAXYS Number:
906752
Assay:
98%
Form:
liquid
vapor pressure
4.18 psi ( 20 °C)
Quality Segment
assay
98%
form
liquid
refractive index
n20/D 1.388 (lit.)
bp
53 °C (lit.)
density
0.709 g/cm3 (lit.)
storage temp.
2-8°C
SMILES string
C[Si](C)(C)C#C
InChI
1S/C5H10Si/c1-5-6(2,3)4/h1H,2-4H3
InChI key
CWMFRHBXRUITQE-UHFFFAOYSA-N
General description
Laser-induced polymerization of gaseous ethynyltrimethylsilane was used for efficient chemical vapour deposition of polycarbosilane films. Ethynyltrimethylsilane acts as substrate for nickel-catalyzed cross-coupling with benzonitriles.
Application
Ethynyltrimethylsilane was used in:
- microwave-assisted, one-pot, three-step Sonogashira cross-coupling-desilylation-cycloaddition reaction for the preparation of 1,4-disubstituted 1,2,3-triazoles
- synthesis of poly(ethynyltrimethylsilane) containing Pd (II) coordination sites
- pyrazole synthesis via 1,3-dipolar cycloaddition of diazo compounds to acetylenes
signalword
Danger
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 2 - Skin Irrit. 2
Storage Class
3 - Flammable liquids
wgk
WGK 1
flash_point_f
-29.2 °F
flash_point_c
-34 °C
ppe
Faceshields, Gloves, Goggles
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