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About This Item
Linear Formula:
CH2=C(CH3)COOC2H5
CAS Number:
Molecular Weight:
114.14
UNSPSC Code:
12162002
NACRES:
NA.25
PubChem Substance ID:
EC Number:
202-597-5
Beilstein/REAXYS Number:
471201
MDL number:
vapor density
>3.9 (vs air)
Quality Segment
vapor pressure
15 mmHg ( 20 °C)
assay
99%
form
liquid
autoignition temp.
771 °F
contains
15-20 ppm monomethyl ether hydroquinone as inhibitor
refractive index
n20/D 1.413 (lit.)
bp
118-119 °C (lit.)
density
0.917 g/mL at 25 °C (lit.)
storage temp.
2-8°C
SMILES string
CCOC(=O)C(C)=C
InChI
1S/C6H10O2/c1-4-8-6(7)5(2)3/h2,4H2,1,3H3
InChI key
SUPCQIBBMFXVTL-UHFFFAOYSA-N
General description
Ethyl methacrylate (EMA) is a monomer commonly used in the field of polymer industries. It is an ester of methacrylic acid and ethanol and is a colorless liquid with a characteristic odor. EMA is widely used in the production of various polymers such as poly(methyl methacrylate) (PMMA), poly(ethyl acrylate) (PEA), and ethylene-EMA (EE). These polymers find their application in various fields, including medical implant devices, packaging, paper coatings, textile coatings, emulsion polymers, and plastics.
Ethyl methacrylate is a readily polymerizable monomer used for certain types of acrylic resins. The monomethyl ether hydroxyl quinone present in it is an inhibitor that prevents polymerization.
Ethyl methacrylate is a readily polymerizable monomer used for certain types of acrylic resins. The monomethyl ether hydroxyl quinone present in it is an inhibitor that prevents polymerization.
Application
Ethyl methacrylate (EMA) can be used as a monomer in the following applications:
- To synthesize artificial nanosized latexes of poly(styrene-co-methyl methacrylate) or poly(styrene-co-ethyl methacrylate), which are in producing drug-releasing films.
- In the production of additive-manufactured methacrylate-based resins used in dentistry.
- In the synthesis of a star-shaped block copolymer electrolyte for all-solid-state lithium batteries.
- In the synthesis of a copolymer used as a matrix for semiconductor nanoparticles, which is crucial for the formation of a stable matrix for the quantum dots-copolymer composite material used in optoelectronic applications.
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signalword
Danger
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3
target_organs
Respiratory system
Storage Class
3 - Flammable liquids
wgk
WGK 1
flash_point_f
66.2 °F - closed cup
flash_point_c
19 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
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