403393
Nickel(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate)
97%
Synonym(s):
Ni(TMHD)2
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About This Item
Linear Formula:
Ni(OCC(CH3)3CHCOC(CH3)3)2
CAS Number:
Molecular Weight:
425.23
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
Quality Segment
assay
97%
form
solid
reaction suitability
core: nickel
mp
219-223 °C (lit.)
SMILES string
CC(C)(C)C(=O)\C=C(\O[Ni]O\C(=C\C(=O)C(C)(C)C)C(C)(C)C)C(C)(C)C
InChI
1S/2C11H20O2.Ni/c2*1-10(2,3)8(12)7-9(13)11(4,5)6;/h2*7,12H,1-6H3;/q;;+2/p-2/b2*8-7+;
InChI key
PIIJAZNTPALBJL-ORWWTJHYSA-L
General description
Nickel(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate) [Ni(TMHD)₂] is a green crystalline solid that exhibits moderate volatility and good thermal stability, making it effective for use in vapor-phase processes. The bulky TMHD ligands enhance its volatility while maintaining thermal stability, making it suitable for chemical vapor deposition (CVD) and atomic layer deposition (ALD). These properties enable the controlled deposition of thin, uniform layers of nickel or nickel oxide on complex surfaces. Additionally, its solubility in organic solvents supports solution-based processing techniques. Its well-defined decomposition behaviour ensures clean film formation with minimal impurities, which is essential for electronic, catalytic, and energy-storage applications.
Application
Nickel(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate) (Ni(TMHD)₂) can be used as:
- A precursor in the synthesis of nickel thin films via atomic layer deposition (ALD), which are used in solar cells, microelectronics and catalysis applications.
- Metal precursor to for preparation of Ni-based catalysts via Atomic Layer Deposition.
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 4 Oral - Carc. 1B
Storage Class
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Gloves, type P3 (EN 143) respirator cartridges
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