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438936

1,4-Bis(trimethylsilyl)benzene

96%

Synonym(s):

p-Phenylenebis(trimethylsilane)

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About This Item

Linear Formula:
C6H4[Si(CH3)3]2
CAS Number:
13183-70-5
Molecular Weight:
222.47
UNSPSC Code:
12352100
NACRES:
NA.22
PubChem Substance ID:
24867483
MDL number:
MFCD00015592
Beilstein/REAXYS Number:
1867055
Assay:
96%
Form:
solid
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Quality Level

100

assay

96%

form

solid

bp

194 °C/742 mmHg (lit.)

mp

91-94 °C (lit.)

SMILES string

C[Si](C)(C)c1ccc(cc1)[Si](C)(C)C

InChI

1S/C12H22Si2/c1-13(2,3)11-7-9-12(10-8-11)14(4,5)6/h7-10H,1-6H3

InChI key

NVRBTKMAZQNKPX-UHFFFAOYSA-N

Application

1,4-Bis(trimethylsilyl)benzene (TMSB) can be used:
  • As a precursor for developing silicon carbide coating using plasma-assisted chemical vapor deposition (CVD) process.
  • As a secondary standard in quantitative NMR (qNMR) spectroscopy.
  • As an internal standard for quantitation of small organic molecules in DMSO-d6 solution by 1H NMR spectroscopy.

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Storage Class

11 - Combustible Solids

wgk

WGK 3

flash_point_f

347.0 °F - closed cup

flash_point_c

175 °C - closed cup

ppe

Eyeshields, Gloves, type N95 (US)

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Certificates of Analysis (COA)

Lot/Batch Number
MKCZ3238
MKCV0638
MKCQ8931
MKCJ9337
MKCH7049

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Synthesis of 1, 4-dihydropyrrolo [3, 2-b] pyrrole.
Kumagai T, et al.
Tetrahedron Letters, 25(49), 5669-5672 (1984)
Role of vapor pressure of 1, 4-bis (trimethylsilyl) benzene in developing silicon carbide thin film using a plasma-assisted liquid injection chemical vapor deposition process
Selvakumar J, et al.
Surface and Coatings Technology, 205(11), 3493-3498 (2011)
Use and qualification of primary and secondary standards employed in quantitative 1H NMR spectroscopy of pharmaceuticals
Rundlof T, et al.
Journal of Pharmaceutical and Biomedical Analysis, 93(11), 111-117 (2014)
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Global Trade Item Number

SKUGTIN
438936-5G04061833064405