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Merck
CN

463019

Silicon tetrafluoride

electronic grade, ≥99.99%

Synonym(s):

Silicon(IV) fluoride

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About This Item

Linear Formula:
SiF4
CAS Number:
7783-61-1
Molecular Weight:
104.08
NACRES:
NA.23
PubChem Substance ID:
24869885
UNSPSC Code:
12352300
EC Number:
232-015-5
MDL number:
MFCD00040533

Key Documents

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Product Name

Silicon tetrafluoride, electronic grade, ≥99.99%

Quality Level

100

InChI key

ABTOQLMXBSRXSM-UHFFFAOYSA-N

InChI

1S/F4Si/c1-5(2,3)4

SMILES string

F[Si](F)(F)F

grade

electronic grade

assay

≥99.99%

form

liquid

reaction suitability

core: silicon

impurities

<0.5 ppm Carbon monoxide (CO)
<1 ppm Argon + oxygen (Ar + O2)
<1 ppm Carbon dioxide (CO2)
<10 ppm Methane (CH4)
<3 ppm Nitrogen (N2)
<50 ppm Hydrogen fluoride (HF)

bp

−86 °C (lit.)

mp

−90 °C (lit.)

transition temp

critical temperature −14.2 °C

density

3.57 g/mL at 25 °C (lit.)

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Application

Silicon tetrafluoride is used in ion-implantation processes and as a precursor to fluorinated silica via plasma-assisted CVD. Mixtures of SiF4-SiH4-H2 have recently been used to deposit polycrystalline silicon thin films via remote plasma chemical vapor deposition (RPCVD). Such fluorinated thin films show visible photoluminescence (PL) at room temperature.

Other Notes

See Technical Information Bulletin AL-151 Gas Regulators: Selection, Installation, and Operation

Packaging

Supplied in a carbon steel lecture bottle with a CGA180M/CGA110F needle valve installed.

Compatible with the following:
  • Aldrich® lecture-bottle station systems
  • Aldrich® lecture-bottle gas regulators

Legal Information

Aldrich is a registered trademark of Sigma-Aldrich Co. LLC

signalword

Danger

Hazard Classifications

Acute Tox. 2 Inhalation - Eye Dam. 1 - Press. Gas Liquefied gas - Skin Corr. 1A

supp_hazards

EUH014,EUH029

Storage Class

2A - Gases

wgk

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles

Regulatory Information

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Certificates of Analysis (COA)

Lot/Batch Number
MKCG7219
MKBW6367V
02848KH
05651DE
09974HD

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Shou-Nan Li et al.
AIHA journal : a journal for the science of occupational and environmental health and safety, 64(3), 408-414 (2003-06-18)
A mobile extractive Fourier transform infrared (FTIR) spectrometer was successfully used to locate, identify, and quantify the "odor" sources inside the cleanroom of a semiconductor manufacturing plant. It was found that ozone (O(3)) gas with a peak concentration of 120
Z Meng et al.
Mutation research, 334(2), 243-246 (1995-04-01)
The frequencies of sister-chromatid exchange (SCE) in peripheral blood lymphocytes of 40 workers at a phosphate fertilizer factory in North China were studied. HF and SiF4 are main air pollutants in the factory, there is also some dust containing fluoride
Z M Xie et al.
Chemosphere, 50(6), 763-769 (2003-04-12)
Characteristics of fluoride emission from 12 soils at temperatures of 400-1,100 degrees C related to the brick-making process were studied. The results obtained in this study indicate that fluoride emission as gaseous HF and SiF4 was related to the firing
R Chirakal et al.
Journal of nuclear medicine : official publication, Society of Nuclear Medicine, 27(3), 417-421 (1986-03-01)
The radiofluorination of L-dopa with [18F]F2 was investigated with the purpose of improving the yield of 6-[18F]fluoro-L-dopa. When boron trifluoride was added to the reaction mixture in hydrogen fluoride (HF), the yield was increased threefold. Nine millicuries of 6-[18F]fluoro-L-dopa were
Diffusion and Defect Data, Solid State Data, Part B, 51-52, 149-149 (1996)
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