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Merck
CN

595063

Titanium nitride

<3 μm

Synonym(s):

Titanium mononitride

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About This Item

Linear Formula:
TiN
CAS Number:
Molecular Weight:
61.87
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352300
EC Number:
247-117-5
MDL number:
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Product Name

Titanium nitride, <3 μm

InChI key

NRTOMJZYCJJWKI-UHFFFAOYSA-N

InChI

1S/N.Ti

SMILES string

N#[Ti]

form

powder

particle size

<3 μm

mp

2930 °C (lit.)

density

5.24 g/mL at 25 °C (lit.)

Quality Level

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Storage Class

13 - Non Combustible Solids

wgk

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Gloves, type N95 (US)


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Andrzej Milenin et al.
Acta of bioengineering and biomechanics, 13(4), 11-19 (2012-02-22)
The main purpose of the research was to develop the micromodel of biocompatible titanium nitride nanocoating deposited on polymer by pulsed laser deposition method in blood chambers of Polish ventricular assist devices: POLVAD and POLVAD_EXT. The analysis of the parameters
Hyun-Pil Lim et al.
The Journal of prosthetic dentistry, 108(4), 209-213 (2012-10-04)
A patient developed contact mucositis after being treated with a titanium nitride implant abutment. Patch testing disclosed a positive reaction to titanium nitride. After removal of the titanium nitride-coated abutment and placement of an uncoated abutment, all signs and symptoms
Liane Klein et al.
Journal of neural engineering, 17(2), 026036-026036 (2020-03-29)
The analysis of interactions among local populations of neurons in the cerebral cortex (e.g. within cortical microcolumns) requires high resolution and high channel count recordings from chronically implanted laminar microelectrode arrays. The request for high-density recordings of a large number
Shi Jin et al.
Colloids and surfaces. B, Biointerfaces, 101, 343-349 (2012-09-27)
The biocompatibility of TiN coated nickel-titanium shape memory alloy (NiTi-SMA) was evaluated to compare with that of the uncoated NiTi-SMA. Based on the orthodontic clinical application, the surface properties and biocompatibility were characterized by scanning electron microscopy (SEM), X-ray diffraction
Seong Keun Kim et al.
ACS applied materials & interfaces, 4(9), 4726-4730 (2012-08-08)
Rutile structured Al-doped TiO(2) (ATO) and TiO(2) films were grown on bimetal electrodes (thin Ru/thick TiN, Pt, and Ir) for high-performance capacitors. The work function of the top Ru layer decreased on TiN and increased on Pt and Ir when

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