643262
Gold coated silicon wafer
99.999% (Au), layer thickness 1000 Å, 99.99% (Ti)
Synonym(s):
gold coated silicon, gold coated wafer
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About This Item
Linear Formula:
Au
Molecular Weight:
196.97
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
Product Name
Gold coated silicon wafer, 99.999% (Au), layer thickness 1000 Å, 99.99% (Ti)
InChI
1S/Au
SMILES string
[Au]
InChI key
PCHJSUWPFVWCPO-UHFFFAOYSA-N
assay
99.99% (Ti)
99.999% (Au)
diam. × thickness
4 in. × 500 μm
layer thickness
1000 Å
matrix attachment
Titanium, as adhesion layer used to bind the gold to the silicon wafer.
Quality Level
Related Categories
Application
Gold coated silicon wafers may be used in soft lithography for micro and nanoscale patterning.
General description
Our gold-coated silicon wafers use electron-beam lithography to form amorphous layers (50Å of titanium followed by 1000Å of gold) on top of the silicon wafer.
The product is highly crystalline, with <111> orientation gold and <100> orientation silicon wafer is used. Titanium is used as an adhesion layer to bind gold to the silicon wafer.
Packaging
Packaging 1 set in single wafer shipper
Storage Class
11 - Combustible Solids
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
Regulatory Information
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Aguilar, M. et al.
Surface Science, 482-485, 935-935 (2001)
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