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Merck
CN

749044

Titanium

sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis

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About This Item

Linear Formula:
Ti
CAS Number:
Molecular Weight:
47.87
UNSPSC Code:
12352103
PubChem Substance ID:
EC Number:
231-142-3
MDL number:
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assay

99.995% trace metals basis

form

solid

autoignition temp.

860 °F

reaction suitability

core: titanium

resistivity

42.0 μΩ-cm, 20°C

diam. × thickness

3.00 in. × 0.125 in.

bp

3287 °C (lit.)

mp

1660 °C (lit.)

density

4.5 g/mL at 25 °C (lit.)

SMILES string

[Ti]

InChI

1S/Ti

InChI key

RTAQQCXQSZGOHL-UHFFFAOYSA-N

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.


Storage Class

11 - Combustible Solids

WGK

nwg

Flash Point (°F)

Not applicable

Flash Point (°C)

Not applicable



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