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760463

Hafnium(IV) tert-butoxide

packaged for use in deposition systems

Synonym(s):

Hafnium tetra-t -butoxide, Hafnium tetrakis(t -butoxide), Tetra-t -butoxyhafnium, Tetrakis(t -butoxy)hafnium

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About This Item

Linear Formula:
Hf[OC(CH3)3]4
CAS Number:
2172-02-3
Molecular Weight:
470.94
NACRES:
NA.23
PubChem Substance ID:
329766868
UNSPSC Code:
12352103
MDL number:
MFCD00070458
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form

liquid

reaction suitability

core: hafnium

refractive index

n20/D 1.424 (lit.)

bp

90 °C/5 mmHg (lit.)

density

1.166 g/mL at 25 °C (lit.)

SMILES string

CC(C)(C)O[Hf](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C

InChI

1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4

InChI key

WZVIPWQGBBCHJP-UHFFFAOYSA-N

Application

Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.

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pictograms

FlameExclamation mark
GHS02,GHS07

signalword

Warning

Hazard Classifications

Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

Storage Class

3 - Flammable liquids

wgk

WGK 3

flash_point_f

82.4 °F - closed cup

flash_point_c

28 °C - closed cup

Regulatory Information

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Certificates of Analysis (COA)

Lot/Batch Number
29396MMV

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Dabrian, A.; et al.
Crystal Growth & Design, 11, 203-203 (2011)
Williams, P. A.; et al
Journal of Materials Chemistry, 12, 165-165 (2002)
Sean W Depner et al.
ACS nano, 8(5), 4678-4688 (2014-04-23)
We demonstrate that the degree of branching of the alkyl (R) chain in a Hf(OR)4 precursor allows for control over the length of HfO2 nanocrystals grown by homocondensation of the metal alkoxide with a metal halide. An extended nonhydrolytic sol-gel

Global Trade Item Number

SKUGTIN
760463-10G04061833607893