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About This Item
Linear Formula:
CH3(CH2)17SH
CAS Number:
Molecular Weight:
286.56
UNSPSC Code:
12352300
NACRES:
NA.23
PubChem Substance ID:
EC Number:
220-744-1
Beilstein/REAXYS Number:
1811934
MDL number:
grade
purum
Quality Level
assay
≥95.0% (GC)
form
solid
bp
204-210 °C/11 mmHg (lit.)
mp
30-33 °C (lit.)
density
0.847 g/mL at 25 °C (lit.)
SMILES string
CCCCCCCCCCCCCCCCCCS
InChI
1S/C18H38S/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-19/h19H,2-18H2,1H3
InChI key
QJAOYSPHSNGHNC-UHFFFAOYSA-N
General description
1-Octadecanethiol (ODT) is a water soluble sulfur compound with an 18 carbon alkyl chain, which forms a strong hydrophobic assembly with transition metals, like gold .It forms self-assembled monolayers (SAMs) on the surface of such transition metals. The thiol membrane when covalently bonded with the surface of the metal electrode, it shows electrostriction phenomenon leading to variation in capacitance.ODT SAMs have a hydrophobic surface with contact angle of 102oC.
Application
ODT is used to deposit thiolated molecules onto the surface of gold substrates, such as
- SAMs on gold quartz crystal resonators.
- on the tip of atomic force microscope probes.
- capacitive sensors.
Analysis Note
may contain precipitation in melt
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signalword
Warning
hcodes
Hazard Classifications
Aquatic Acute 1 - Skin Irrit. 2
Storage Class
11 - Combustible Solids
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
dust mask type N95 (US), Eyeshields, Gloves
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Polarization modulation Fourier transform infrared reflectance measurements of thin films and monolayers at metal surfaces utilizing real-time sampling electronics.
Barbara BJ, et al
Analytical Chemistry, 63(1), 55-60 (1991)
Jimin Yao et al.
Advanced materials (Deerfield Beach, Fla.), 22(10), 1102-1110 (2010-04-20)
Plasmonic crystals fabricated with precisely controlled arrays of subwavelength metal nanostructures provide a promising platform for sensing and imaging of surface binding events with micrometer spatial resolution over large areas. Soft nanoimprint lithography provides a robust, cost-effective method for producing
Khalid S Salaita et al.
Nano letters, 6(11), 2493-2498 (2006-11-09)
Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and
Global Trade Item Number
| SKU | GTIN |
|---|---|
| 138053-5G | 04061832098012 |
| 74731-250G | 04061832882574 |
| 74731-50G | 04061832882581 |

