202118
氧化铪(IV)
powder, 98%
别名:
Hafnia, Hafnium dioxide, Hafnium oxide
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关于此项目
经验公式（希尔记法）:
HfO2
化学文摘社编号:
分子量:
210.49
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352303
EC Number:
235-013-2
MDL number:
Quality Segment
assay
98%
form
powder
composition
HfO₂
reaction suitability
core: hafnium
density
9.68 g/mL at 25 °C (lit.)
application(s)
glass & ceramic
SMILES string
O=[Hf]=O
InChI
1S/Hf.2O
InChI key
CJNBYAVZURUTKZ-UHFFFAOYSA-N
Application
- Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
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存储类别
11 - Combustible Solids
wgk
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Gloves, type N95 (US)