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Merck
CN

334103

氮化硅

powder, ≥99.9% trace metals basis

别名:

Trisilicon tetranitride

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关于此项目

线性分子式:
Si3N4
化学文摘社编号:
分子量:
140.28
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352300
EC Number:
234-796-8
MDL number:
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产品名称

氮化硅, powder, ≥99.9% trace metals basis

InChI key

HQVNEWCFYHHQES-UHFFFAOYSA-N

InChI

1S/N4Si3/c1-5-2-6(1)3(5)7(1,2)4(5)6

SMILES string

N12[Si]34N5[Si]16N3[Si]25N46

assay

≥99.9% trace metals basis

form

powder

particle size

<1 μm

density

3.44 g/mL at 25 °C (lit.)

Quality Level

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General description

氮化硅基陶瓷具有较高的断裂韧性、硬度和耐磨性、耐腐蚀性、热稳定性已知的氮化硅多晶型有两种,α和β Si3N4,它们都具有六方结构。一项研究表明,研究人员还合成了第三种形态,立方尖晶石结构。

存储类别

11 - Combustible Solids

wgk

nwg

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

dust mask type N95 (US), Eyeshields, Gloves


历史批次信息供参考:

分析证书(COA)

Lot/Batch Number

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Silicon Nitride and Related Materials
Riley FR
Journal of the American Ceramic Society. American Ceramic Society, 83(2), 245-265 (2000)
Synthesis of cubic silicon nitride
Zerr A, et al
Nature, 400, 340-342 null
Orsolya Tapasztó et al.
Journal of nanoscience and nanotechnology, 12(11), 8775-8778 (2013-02-21)
The dispersion properties of single- and multi-walled carbon nanotubes as well as mechanically exfoliated few layer graphene flakes within the silicon nitride ceramic matrix have been investigated. Small angle neutron scattering experiments have been employed to gain information on the
Xander J A Janssen et al.
Nanotechnology, 23(47), 475302-475302 (2012-10-30)
In recent years, the concept of nanopore sensing has matured from a proof-of-principle method to a widespread, versatile technique for the study of biomolecular properties and interactions. While traditional nanopore devices based on a nanopore in a single layer membrane
Zhifeng Shi et al.
Journal of the mechanical behavior of biomedical materials, 16, 9-20 (2012-11-10)
Behaviors of silicon nitride films and their relation to blood compatibility and biomechanical have been interesting subjects to researchers. A systematic blood compatibility and biomechanical property investigation on the deposition of silicon-nitride films under varying N₂ and CF₄ flows was

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