374423
3-三甲基硅氧基-1-丙炔
98%
别名:
(丙炔氧基)三甲基硅烷, O-(三甲基硅基)丙炔醇, 三甲基-2-丙炔氧基硅烷, 丙炔氧基三甲基硅烷
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关于此项目
线性分子式:
HC≡CCH2OSi(CH3)3
化学文摘社编号:
分子量:
128.24
UNSPSC Code:
12352100
NACRES:
NA.22
PubChem Substance ID:
EC Number:
226-981-7
Beilstein/REAXYS Number:
2036793
MDL number:
assay
98%
refractive index
n20/D 1.408 (lit.)
bp
52 °C/85 mmHg (lit.)
density
0.835 g/mL at 25 °C (lit.)
SMILES string
C[Si](C)(C)OCC#C
InChI
1S/C6H12OSi/c1-5-6-7-8(2,3)4/h1H,6H2,2-4H3
InChI key
ZZRPJWCNCLSOLR-UHFFFAOYSA-N
General description
3-Trimethylsiloxy-1-propyne is an organosilicon compound. It is reported as silylated acetylenic monomer and its polymerizability has been studied in the presence of combined catalyst iron(III) propanoate-triethylaluminium. N2 laser light-induced aerosol particle formation from 3-trimethylsiloxy-1-propyne (trimethyl(2-propynyloxy)silane) and acrolein has been reported. The infrared laser-photosensitized (SF6) decomposition of trimethyl(2-propynyloxy)silane is reported to afford a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane phase.
Application
3-Trimethylsiloxy-1-propyne (Trimethyl(2-propynyloxy)silane) may be used in the synthesis of polytrialkylsiloxy-substituted macromolecules. It may be utilized in the preparation of functionalized 4-enynes and 1,4-dienes.
IR laser photosensitized decomposition of trimethyl (2-propynyloxy) silane for chemical vapour deposition of polydimethylsiloxane phases.
Urbanova M, et al.
Journal of Analytical and Applied Pyrolysis, 44(2), 219-226 (1992)
Journal of Organometallic Chemistry, 420, 163-163 (1991)
UV laser-induced gas-phase polymerization of trimethyl (propynyloxy) silane.
Pola J and Morita H.
Tetrahedron, 38(44), 7809-7812 (1997)