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关于此项目
经验公式(希尔记法):
BCl3
化学文摘社编号:
分子量:
117.17
NACRES:
NA.22
PubChem Substance ID:
UNSPSC Code:
12352106
MDL number:
Concentration:
1.0 M in toluene
InChI
1S/BCl3/c2-1(3)4
SMILES string
ClB(Cl)Cl
InChI key
FAQYAMRNWDIXMY-UHFFFAOYSA-N
concentration
1.0 M in toluene
density
0.909 g/mL at 25 °C
Quality Level
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General description
Boron trichloride (BCl3) is a boron halide typically used as a reagent in organic synthesis for the cleavage of C-O bonds in ethers.
Application
Boron trichloride (BCl3) can be used as a reactant in the preperation of borazine-linked polymer [BLP-10(Cl)] by thermal decomposition with benzidine for gas storage and purification.
signalword
Danger
Hazard Classifications
Acute Tox. 2 Oral - Acute Tox. 3 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Dam. 1 - Flam. Liq. 2 - Repr. 1B - Skin Corr. 1B - STOT RE 2 - STOT SE 3
target_organs
Central nervous system
supp_hazards
存储类别
3 - Flammable liquids
wgk
WGK 3
flash_point_f
-2.0 °F
flash_point_c
-18.9 °C
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
法规信息
新产品
此项目有
Highly selective CO 2/CH 4 gas uptake by a halogen-decorated borazine-linked polymer
Reich TE, et al.
Journal of Materials Chemistry, 22(27), 13524-13528 (2012)
Conversion of aromatic aldehydes to gem-dichlorides using boron trichloride. A new highly efficient method for preparing dichloroarylmethanes.
Kabalka G W and Wu Z
Tetrahedron Letters, 41(5), 579-581 (2000)
Novel polyhydroxylated cyclic nitrones and N-hydroxypyrrolidines through BCl3-mediated deprotection.
Stéphanie Desvergnes et al.
Organic letters, 10(14), 2967-2970 (2008-06-24)
A general method to prepare a new class of carbohydrate-derived, enantiomerically pure polyhydroxypyrroline N-oxides from their alkoxy (protected) derivatives is presented. Boron trichloride is shown to cleave efficiently benzyl ethers and ketals without affecting the imine N-oxide functionality of nitrones.
Guillaume Reinisch et al.
The journal of physical chemistry. A, 115(18), 4786-4797 (2011-04-16)
We report on a theoretical study of the gas-phase decomposition of boron trichloride in the presence of hydrogen radicals using ab initio energetic calculations coupled to TST, RRKM, and VTST-VRC kinetic calculations. In particular, we present an addition-elimination mechanism (BCl(3)
Robert Winker et al.
International archives of occupational and environmental health, 81(4), 423-428 (2007-07-27)
To examine whether semiconductor workers exposed to complex mixtures of chemical waste show an increase in genotoxic effects, and, if so, whether occupational safety measures protect these workers. To assess chemical exposure in the workplace, air monitoring of boron trifluoride
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