749052
铬
sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis
别名:
Chromium element
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关于此项目
经验公式（希尔记法）:
Cr
化学文摘社编号:
分子量:
52.00
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
EC Number:
231-157-5
MDL number:
assay
99.95% trace metals basis
form
solid
reaction suitability
core: chromium
resistivity
12.7 μΩ-cm, 20°C
diam. × thickness
3.00 in. × 0.125 in.
bp
2672 °C (lit.)
mp
1857 °C (lit.)
density
7.14 g/mL at 25 °C (lit.)
SMILES string
[Cr]
InChI
1S/Cr
InChI key
VYZAMTAEIAYCRO-UHFFFAOYSA-N
Application
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.
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存储类别
11 - Combustible Solids
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nwg
闪点 (F)
Not applicable
闪点 (°C)
Not applicable