form
liquid
refractive index
n
bp
155 °C/0.01 mmHg (lit.)
mp
21 °C (lit.)
density
1.566 g/mL at 25 °C (lit.)
SMILES string
CCO[Ta](OCC)(OCC)(OCC)OCC
InChI
1S/5C2H5O.Ta/c5*1-2-3;/h5*2H2,1H3;/q5*-1;+5
InChI key
HSXKFDGTKKAEHL-UHFFFAOYSA-N
Application
Tantalum(V) ethoxide precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods
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警示词
Warning
危险代码
Hazard Classifications
Flam. Liq. 3
存储类别
3 - Flammable liquids
怎么回事？
WGK 1
闪点 (F)
84.2 °F - closed cup
闪点 (°C)
29 °C - closed cup