产品名称
氧化锆(IV), sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis (excludes 2% HfO2)
InChI key
MCMNRKCIXSYSNV-UHFFFAOYSA-N
InChI
1S/2O.Zr
SMILES string
O=[Zr]=O
assay
99.95% trace metals basis (excludes 2% HfO2)
form
powder
reaction suitability
core: zirconium
diam. × thickness
2.00 in. × 0.25 in.
bp
5000 °C (lit.)
mp
2700 °C (lit.)
density
5.89 g/mL at 25 °C (lit.)
正在寻找类似产品? 访问 产品对比指南
Application
Zirconium oxide sputtering target can be used for physical vapor deposition of zirconia thin films for IT-SOFC, thermal barrier coatings, lead zirconium titanate (PZT) films for sensor applications and other zirconium containing films for different applications.
存储类别
11 - Combustible Solids
wgk
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
法规信息
商品
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
我们的科学家团队拥有各种研究领域经验,包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
联系客户支持