774030
氧化锆(IV)
sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis (excludes 2% HfO2)
别名:
二氧化锆
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线性分子式:
ZrO2
化学文摘社编号:
分子量:
123.22
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352300
EC Number:
215-227-2
MDL number:
InChI key
MCMNRKCIXSYSNV-UHFFFAOYSA-N
InChI
1S/2O.Zr
SMILES string
O=[Zr]=O
assay
99.95% trace metals basis (excludes 2% HfO2)
form
powder
reaction suitability
core: zirconium
diam. × thickness
2.00 in. × 0.25 in.
mp
2700 °C (lit.)
density
5.89 g/mL at 25 °C (lit.)
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Application
Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Zirconium oxide sputtering target can be used for physical vapor deposition of zirconia thin films for IT-SOFC, thermal barrier coatings, lead zirconium titanate (PZT) films for sensor applications and other zirconium containing films for different applications.
Zirconium oxide sputtering target can be used for physical vapor deposition of zirconia thin films for IT-SOFC, thermal barrier coatings, lead zirconium titanate (PZT) films for sensor applications and other zirconium containing films for different applications.
存储类别
11 - Combustible Solids
wgk
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
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