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Merck
CN

900755

SLAP TA

95%

别名:

3-(((Trimethylsilyl)methyl)thio)propan-1-amine

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关于此项目

经验公式(希尔记法):
C7H19NSSi
化学文摘社编号:
分子量:
177.38
MDL number:
UNSPSC Code:
12352103
NACRES:
NA.22
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Quality Segment

assay

95%

form

liquid

density

0.90452

functional group

amine, thioether

storage temp.

2-8°C

SMILES string

[Si](CSCCCN)(C)(C)C

InChI

1S/C7H19NSSi/c1-10(2,3)7-9-6-4-5-8/h4-8H2,1-3H3

InChI key

CNESDLLESCAVSR-UHFFFAOYSA-N

Application

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)2dtbbpy]PF6 (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)3 (633305) and Cu(OTf)2 (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.


pictograms

Flame

signalword

Warning

hcodes

Hazard Classifications

Flam. Liq. 3

存储类别

3 - Flammable liquids

wgk

WGK 3

flash_point_f

75.0 °F

flash_point_c

23.89 °C



历史批次信息供参考:

分析证书(COA)

Lot/Batch Number

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