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Merck
CN

920053

Sigma-Aldrich

Graphene, monolayer film

large grain, CVD graphene on copper foil, A3 size

别名:

Roll-to-Roll graphene

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关于此项目

线性分子式:
C
化学文摘社编号:
1034343-98-0
MDL编号:
MFCD00146977
UNSPSC代码:
12141908
NACRES:
NA.23

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产品名称

R2R Monolayer large grain CVD graphene on copper foil, A3 size, avg. no. of layers, 1

质量水平

100

描述

Growth method: roll-to-roll CVD
Number of layer: Monolayer
Raman intensity 2D/G: ≥1.5

特点

avg. no. of layers 1

薄层电阻

280 Ω/sq ±10%

尺寸

110 μm × 110 μm ± 10% , grain size

厚度

35 μm , Cu Foil

表面覆盖度

surface coverage >98%

透射比

>97%

半导体性质

(mobility>3000 cm2/V·s) (Hall effect measurements)

SMILES字符串

NC.NC.NC.NC.NC.NC.NC.NC.NC

InChI

1S/9CH5N/c9*1-2/h9*2H2,1H3

InChI key

DXIFQVRACSPGSU-UHFFFAOYSA-N

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相关类别

一般描述

Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (∼110μm2) on copper foil, A3 size.

应用

Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.

This large grain size product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.

Application examples:
  • Ultrafast Transistor
  • Optical devices
  • Bio/Gas Sensor
  • Transparent Electrode
  • Flexible Display
  • Smart Coating
  • Thermal management

制备说明

Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.
Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.

法律信息

Product of LG Electronics, R&D use only

象形图

Environment
GHS09

警示用语：

Warning

危险声明

H410

预防措施声明

P273 - P391 - P501

危险分类

Aquatic Acute 1 - Aquatic Chronic 1

储存分类代码

13 - Non Combustible Solids

WGK

WGK 2

闪点(°F)

Not applicable

闪点(°C)

Not applicable

法规信息

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Integrating graphene into semiconductor fabrication lines.
Daniel Neumaier et al.
Nature materials, 18(6), 525-529 (2019-05-23)
Hao-Ling Tang et al.
ACS nano, 11(12), 12817-12823 (2017-11-29)
Two-dimensional (2D) materials are drawing growing attention for next-generation electronics and optoelectronics owing to its atomic thickness and unique physical properties. One of the challenges posed by 2D materials is the large source/drain (S/D) series resistance due to their thinness
Bing Deng et al.
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain

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