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Merck
CN

GF40402572

foil, 6mm disks, thickness 0.009mm, 99.9%

别名:

钽, Ta

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经验公式(希尔记法):
Ta
化学文摘社编号:
分子量:
180.95
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12141741
MDL number:
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产品名称

钽, foil, 6mm disks, thickness 0.009mm, 99.9%

InChI

1S/Ta

SMILES string

[Ta]

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

vapor pressure

<0.01 mmHg ( 537.2 °C)

assay

99.9%

form

foil

autoignition temp.

572 °F

manufacturer/tradename

Goodfellow 404-025-72

resistivity

13.5 μΩ-cm, 20°C

diam. × thickness

6 mm × 0.009 mm

bp

5425 °C (lit.)

mp

2996 °C (lit.)

density

16.69 g/cm3 (lit.)

General description

For updated SDS information please visit www.goodfellow.com.

Legal Information

Product of Goodfellow

法规信息

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Zhongli Cai et al.
Radiation research, 165(3), 365-371 (2006-02-24)
Both thick and thin films of pGEMR-3Zf- plasmid DNA deposited on a tantalum foil were exposed to soft X rays (effective energy of 14.8 keV) for various times in air under a relative humidity of 45% (Gamma approximately 6, where
J G Sen Gupta
Talanta, 32(1), 1-6 (1985-01-01)
An improved graphite furnace atomic-absorption method has been developed for the determination of Sc, Y and the rare-earth elements in silicate rocks and related materials. The method, which involves the separation of the lanthanides by ion-exchange followed by their determination
Yingxun Du et al.
Journal of hazardous materials, 225-226, 21-27 (2012-05-23)
In order to overcome the limitation of the application of nanoparticles, tantalum (oxy)nitrides nanotube arrays on a Ta foil were synthesized and introduced in vis (visible light)-Fenton-like system to enhance the degradation of atrazine. At first, the anodization of tantalum
J G Sen Gupta
Talanta, 31(12), 1053-1056 (1984-12-01)
A 40-fold increase in sensitivity obtained by using a tantalum foil lining in a pyrolytically-coated graphite furnace permitted determination of low ppm levels of cerium in most silicate rocks. A preliminary preconcentration by oxalate and hydroxide co-precipitations was used before
T Y Hung et al.
Applied optics, 31(22), 4397-4404 (1992-08-01)
A simple four-element fused-silica lens is presented that has a focal length of 31.2 mm and a relative aperture of f/1 for use as a focusing lens for deep UV laser processing. The curvature of the lens is designed with

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