01302
氟硅酸
purum, 33.5-35%
别名:
六氟硅酸, 氢氟硅酸, 硅氟酸
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关于此项目
线性分子式:
H2SiF6
化学文摘社编号:
分子量:
144.09
MDL编号:
UNSPSC代码:
12352300
eCl@ss:
38130308
PubChem化学物质编号:
NACRES:
NA.21
等级
purum
质量水平
浓度
33.5-35%
杂质
≤0.003% heavy metals (as Pb)
密度
1.22 g/mL at 20 °C (lit.)
1.31 g/mL at 25 °C
痕量阴离子
chloride (Cl-): ≤0.2%
phosphate (PO43-): ≤1000 mg/kg
sulfate (SO42-): ≤0.2%
痕量阳离子
Fe: ≤100 mg/kg
SMILES字符串
F.F.F[Si](F)(F)F
InChI
1S/F4Si.2FH/c1-5(2,3)4;;/h;2*1H
InChI key
ZEFWRWWINDLIIV-UHFFFAOYSA-N
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一般描述
已经制备了高硅氟硅酸。它们所需的额外二氧化硅含量要比 H2SiF6所代表的组成高18%。已报道了氟硅酸的制备和性质。氟硅酸可以作为磷酸盐肥料的主要副产物获得。可通过氯化钠中和用于制备氟硅酸钠。还可与氨进行中和生成氟化铵和二氧化硅。
应用
氟硅酸 (FSA,H 2 SiF 6 ) 已用于以下研究:
- 含氟市政供水的氟化。
- 碳酸钙的表面改性。
- 二氧化硅的液相沉积(LPD)。
警示用语:
Danger
危险声明
危险分类
Acute Tox. 3 Dermal - Acute Tox. 4 Oral - Eye Dam. 1 - Skin Corr. 1
储存分类代码
6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects
WGK
WGK 2
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
法规信息
危险化学品
此项目有
Fluosilicic acid.
Journal of Chemical Education, 35(11), 562-562 (1958)
"Recovery of high surface area mesoporous silica from waste hexafluorosilicic acid (H 2 SiF 6) of fertilizer industry"
Sarawade.BP, et al.
Journal of Hazardous Materials, 173(01), 576-580 (2010)
Myron J Coplan et al.
Neurotoxicology, 28(5), 1032-1042 (2007-04-11)
Silicofluorides (SiFs), fluosilicic acid (FSA) and sodium fluosilicate (NaFSA), are used to fluoridate over 90% of US fluoridated municipal water supplies. Living in communities with silicofluoride treated water (SiFW) is associated with two neurotoxic effects: (1) Prevalence of children with
P Zhu et al.
Journal of virology, 75(14), 6682-6686 (2001-06-20)
CD4-immunoglobulin G2 (CD4-IgG2) incorporates four copies of the D1D2 domains of CD4 into an antibody-like molecule that potently neutralizes primary human immunodeficiency virus type 1. Here electron microscopy was used to explore the structure and functional valence of CD4-IgG2 in
"Concentration and purification of fluosilicic acid by membrane distillation"
Tomaszewska.M
Industrial & Engineering Chemistry Research, 39(08), 3038-3041 (2000)
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