440108
三氯苯硅烷
≥97.0%, liquid
别名:
苯基三氯硅烷
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关于此项目
线性分子式:
C6H5SiCl3
化学文摘社编号:
分子量:
211.55
NACRES:
NA.21
PubChem Substance ID:
UNSPSC Code:
12352100
EC Number:
202-640-8
MDL number:
产品名称
三氯苯硅烷, ≥97.0%
InChI
1S/C6H5Cl3Si/c7-10(8,9)6-4-2-1-3-5-6/h1-5H
InChI key
ORVMIVQULIKXCP-UHFFFAOYSA-N
SMILES string
Cl[Si](Cl)(Cl)c1ccccc1
assay
≥97.0%
form
liquid
refractive index
n20/D 1.523 (lit.)
bp
201 °C (lit.)
density
1.321 g/mL at 25 °C (lit.)
Quality Level
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General description
三氟（苯基）硅烷可与脂肪醇反应生成苯、烷氧基氟和四烷氧基硅烷。该硅烷在其气相下发生的水解缩合导致 1，1，3，3-四氯-1，3-二苯基二硅氧烷的形成。
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 4 Dermal - Eye Dam. 1 - Skin Corr. 1A
supp_hazards
存储类别
8A - Combustible corrosive hazardous materials
wgk
WGK 1
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
法规信息
危险化学品
此项目有
Cleavage of the C-Si bond in Trifluoro (phenyl) silane with Aliphatic Alcohols.
Russ. J. Gen. Chem., 75(12), 1927-1929 (2005)
Qian Wu et al.
Journal of hazardous materials, 336, 222-231 (2017-05-12)
In this study, a novel strategy was developed to fabricate highly flame retardant polymer foam composite materials coated by synthesized silicone resin (SiR) polymer via a facile dip-coating processing. Applying the SiR polymer coating, the mechanical property and thermal stability
Syntheses and structural analyses of 1, 3-diphenyldisiloxanes as a building block of silsesquioxanes.
Bulletin of the Chemical Society of Japan, 76(10), 1983-19887 (2003)
Xiaona Wen et al.
Bioengineering & translational medicine, 5(3), e10165-e10165 (2020-10-03)
Precise monitoring of specific biomarkers in biological fluids with accurate biodiagnostic sensors is critical for early diagnosis of diseases and subsequent treatment planning. In this work, we demonstrated an innovative biodiagnostic sensor, portable reusable accurate diagnostics with nanostar antennas (PRADA)
Phillip C Chambers et al.
Beilstein journal of nanotechnology, 9, 1211-1219 (2018-05-17)
Nanostructures of 4-(chloromethyl)phenyltrichlorosilane (CMPS) were used as a foundation to attach and grow heterostructures of porphyrins and organosilanes. A protocol was developed with particle lithography using steps of immersion in organosilane solutions to selectively passivate the surface of Si(111) with
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