H11300
六亚甲基四胺
99%, ReagentPlus®
别名:
1,3,5,7-四氮杂三环[3.3.1.13,7]癸烷, 乌洛托品, 六亚甲基四胺
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关于此项目
经验公式（希尔记法）:
C6H12N4
化学文摘社编号:
分子量:
140.19
NACRES:
NA.21
PubChem Substance ID:
UNSPSC Code:
12352100
EC Number:
202-905-8
MDL number:
Beilstein/REAXYS Number:
2018
产品名称
六亚甲基四胺, ReagentPlus®, 99%
InChI key
VKYKSIONXSXAKP-UHFFFAOYSA-N
InChI
1S/C6H12N4/c1-7-2-9-4-8(1)5-10(3-7)6-9/h1-6H2
SMILES string
C1N2CN3CN1CN(C2)C3
vapor pressure
<0.01 mmHg ( 20 °C)
product line
ReagentPlus®
assay
99%
autoignition temp.
770 °F
mp
280 °C (subl.) (lit.)
solubility
H2O: soluble
Quality Level
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Application
六亚甲基四胺可用于合成：
- 氮掺杂黄金红石型二氧化钛
- 氮掺杂石墨烯片 (NGS)
- 高稳定性石墨烯水分散体
General description
六亚甲基四胺 (HMT) 是一种水溶性笼状有机高分子，被用于合成新型配位聚合物。已研究其在硫酸溶液中抑制低碳钢腐蚀的能力，分析了在 HMT 晶体中观察到的压电效应。以 HMT 为燃料，采用溶液燃烧技术制备二元、三元和四元金属氧化物的方法已有说明。
Legal Information
ReagentPlus is a registered trademark of Merck KGaA, Darmstadt, Germany
signalword
Warning
hcodes
Hazard Classifications
Flam. Sol. 2 - Skin Sens. 1B
存储类别
4.1B - Flammable solid hazardous materials
wgk
WGK 1
flash_point_f
482.0 °F - closed cup
flash_point_c
250 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
法规信息
易制爆化学品
危险化学品
此项目有
Preparation of nitrogen-doped titania with high visible light induced photocatalytic activity by mechanochemical reaction of titania and hexamethylenetetramine.
Yin S, et al.
Journal of Materials Chemistry, 13(12), 2996-3001 (2003)
Hydrothermal preparation of nitrogen-doped graphene sheets via hexamethylenetetramine for application as supercapacitor electrodes.
Lee JW, et al.
Electrochimica Acta, 85, 459-466 (2012)
Hexamethylenetetramine: an old new building block for design of coordination polymers.
Kirillov AM.
Coordination Chemistry Reviews, 255(15), 1603-1622 (2011)
Stable aqueous dispersions of graphene prepared with hexamethylenetetramine as a reductant.
Shen X, et al.
Journal of Colloid and Interface Science, 354(2), 493-497 (2011)
Hexamethylenetetramine: a new fuel for solution combustion synthesis of complex metal oxides.
Prakash AS, et al.
J. Mater. Synth. Process, 10(3), 135-141 (2002)
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