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Merck
CN

342890

Silicon dioxide

−325 mesh, 99.5% trace metals basis

Synonym(s):

Cristobalite, Quartz, Sand, Silica

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About This Item

Linear Formula:
SiO2
CAS Number:
Molecular Weight:
60.08
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352303
EC Number:
262-373-8
MDL number:
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Product Name

Silicon dioxide, −325 mesh, 99.5% trace metals basis

InChI key

VYPSYNLAJGMNEJ-UHFFFAOYSA-N

InChI

1S/O2Si/c1-3-2

SMILES string

O=[Si]=O

assay

99.5% trace metals basis

form

powder

refractive index

n20/D 1.544 (lit.)

particle size

−325 mesh

mp

1610 °C (lit.)

density

2.6 g/mL at 25 °C (lit.)

application(s)

battery manufacturing

Quality Level

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Application

SiO2 is majorly used as a substrate material with excellent thermo-mechanical properties which can be used in a variety of applications which include: vapor deposition, phase deposition, atomic force microscopy probes(AFM), spin coating, electronic based devices.

Other Notes

May contain adsorbed H2O and CO2 which is removable by calcining at >900°C

Storage Class

13 - Non Combustible Solids

wgk

nwg

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

dust mask type N95 (US), Eyeshields, Gloves


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The effect of calcination temperature on the surface microstructure and photocatalytic activity of TiO2 thin films prepared by liquid phase deposition.
Yu J, et al.
The Journal of Physical Chemistry B, 107(50), 13871-13879 (2003)
Exciton diffusion measurements in poly (3-hexylthiophene).
Shaw PE, et al.
Advanced Materials, 20(18), 3516-3520 (2008)
Electrical and optical properties of ZnO transparent conducting films by the sol-gel method.
Lee J, et al.
Journal of Crystal Growth, 247(1-2), 119-125 (2003)
Oxygen-aided synthesis of polycrystalline graphene on silicon dioxide substrates.
Chen J, et al.
Journal of the American Chemical Society, 133(44), 17548-17551 (2011)
Measurement of the adhesion force between carbon nanotubes and a silicon dioxide substrate.
Whittaker JD, et al.
Nano Letters, 6(5), 953-957 (2006)

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