Robert H Temperton et al.
Physical chemistry chemical physics : PCCP, 21(3), 1393-1398 (2019-01-03)
Ultra-thin aluminium oxide was grown on a rutile titanium dioxide surface by atomic layer deposition using trimethylaluminium and water precursors. This process, carried out using realistic temperatures and pressures (1 mbar, 450 K), was monitored in situ using near-ambient pressure