394505
二氟代氙
99.99% trace metals basis
别名:
Xenon Fluoride (XeF2)
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关于此项目
线性分子式:
XeF2
CAS Number:
分子量:
169.29
EC 号:
MDL编号:
UNSPSC代码:
12352300
PubChem化学物质编号:
NACRES:
NA.23
蒸汽压
3.8 mmHg ( 25 °C)
质量水平
方案
99.99% trace metals basis
表单
crystals
mp
129 °C (lit.)
密度
4.32 g/mL at 25 °C (lit.)
SMILES字符串
F[Xe]F
InChI
1S/F2Xe/c1-3-2
InChI key
IGELFKKMDLGCJO-UHFFFAOYSA-N
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一般描述
在 473-523 oC 和 5 个绝对大气压下，氟化氙可以通过元素氙与氟相互作用得到。二氟化氙容易与路易斯酸相互作用，形成络合物。
应用
非常有用的氟化剂。氟化氙可用作氟化剂，通过气相色谱分析硫、硒和碲。
包装
PFA/FEP 瓶封装
警示用语：
Danger
危险分类
Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B
储存分类代码
5.1B - Oxidizing hazardous materials
WGK
WGK 3
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
Fluorination with XeF(2).(1) 44. Effect of Geometry and Heteroatom on the Regioselectivity of Fluorine Introduction into an Aromatic Ring.
Marko Zupan et al.
The Journal of organic chemistry, 63(3), 878-880 (2001-10-24)
Use of Xenon difluoride for the determination of sulfur, selenium and tellurium as the volatile fluorides by gas chromatography
Aleinikov NN, et al.
Russian Chemical Bulletin, 22(11), 2552-2554 (1973)
Infrared spectra of complex compounds of xenon difluoride with ruthenium pentafluoride
Prusakov VN, et al.
Journal of Applied Spectroscopy, 17(1), 920-922 (1972)
James P Camp et al.
Biomedical microdevices, 10(2), 179-186 (2007-09-25)
The majority of microfluidic devices employ networks of channels that have rectangular cross-sections. At the microvascular scale of 30 to 300 microm in diameter, however, the distribution of fluid mechanical stresses and the induced shape of cultured cells will be
E M Farrell et al.
Journal of vascular surgery, 3(2), 284-287 (1986-02-01)
Laser angioplasty has been limited by the lack of precise control of thermal and acoustic vascular injury. Pulsed excimer lasers, by contrast, have a capacity to affect target tissue without heat dispersion or damage to surrounding structures. The ablative properties
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