40289
丙酮
别名:
Dimethyl ketone
登录 查看组织和合同定价。
选择尺寸
变更视图
关于此项目
线性分子式:
CH3COCH3
化学文摘社编号:
分子量:
58.08
UNSPSC Code:
12352115
PubChem Substance ID:
eCl@ss:
39021201
EC Number:
200-662-2
Beilstein/REAXYS Number:
635680
MDL number:
Bp:
56 °C/760 mmHg (lit.)
Vapor pressure:
184 mmHg ( 20 °C)
vapor density
2 (vs air)
vapor pressure
184 mmHg ( 20 °C)
CofA
specification on request
expl. lim.
13.2 %
color
clear colorless
refractive index
n20/D 1.359 (lit.)
bp
56 °C/760 mmHg (lit.)
mp
−94 °C (lit.)
density
0.791 g/mL at 25 °C (lit.)
format
neat
SMILES string
CC(C)=O
InChI
1S/C3H6O/c1-3(2)4/h1-2H3
InChI key
CSCPPACGZOOCGX-UHFFFAOYSA-N
Application
Semiconductor grade acetone may be used for cleaning of the surfaces, such as;
The semiconductor grade acetone was also used in a comparative study for observing the effect of various solvents on nitrogen containing promoters (NCPs), which is used in oxidation reaction of 5-hydroxymethylfurfural.
- Hydrogen terminated silicon wafer.
- SiC wafers.
- Chromium nitride epilayer on silicon wafer.
The semiconductor grade acetone was also used in a comparative study for observing the effect of various solvents on nitrogen containing promoters (NCPs), which is used in oxidation reaction of 5-hydroxymethylfurfural.
丙酮的发光强度取决于溶液组分。丙酮吸收UV光，导致丙酮光分解和放射性产物。
Still not finding the right product?
Explore all of our products under 丙酮
signalword
Danger
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 2 - STOT SE 3
target_organs
Central nervous system
supp_hazards
存储类别
3 - Flammable liquids
wgk
WGK 1
flash_point_f
1.4 °F - closed cup
flash_point_c
-17.0 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves
法规信息
新产品
此项目有
Cu catalyzed oxidation of 5-hydroxymethylfurfural to 2, 5-diformylfuran and 2, 5-furandicarboxylic acid under benign reaction conditions.
Hansen T, et al.
Applied Catalysis A: General, 456, 44-50 (2013)
Covalently attached organic monolayers onto silicon carbide from 1-alkynes: molecular structure and tribological properties.
Pujari S, et al.
Langmuir, 29(13), 4019-4031 (2013)
Mono-fluorinated alkyne-derived SAMs on oxide-free Si (111) surfaces: preparation, characterization and tuning of the Si workfunction
Pujari S, et al.
Langmuir, 29(2), 570-580 (2013)