双(2,2,6,6,-四甲基-3,5-庚二酮酸)镍(II)

Name: 双(2,2,6,6,-四甲基-3,5-庚二酮酸)镍(II)
Brand: ALDRICH

97%

别名:

Ni(TMHD)₂

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线性分子式:

Ni(OCC(CH₃)₃CHCOC(CH₃)₃)₂

化学文摘社编号:

14481-08-4

分子量:

425.23

NACRES:

NA.23

PubChem Substance ID:

24865189

UNSPSC Code:

12352103

MDL number:

MFCD00192348

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产品名称

双(2,2,6,6,-四甲基-3,5-庚二酮酸)镍(II), 97%

InChI

1S/2C11H20O2.Ni/c2*1-10(2,3)8(12)7-9(13)11(4,5)6;/h2*7,12H,1-6H3;/q;;+2/p-2/b2*8-7+;

SMILES string

CC(C)(C)C(=O)\C=C(\O[Ni]O\C(=C\C(=O)C(C)(C)C)C(C)(C)C)C(C)(C)C

InChI key

PIIJAZNTPALBJL-ORWWTJHYSA-L

assay

97%

form

solid

reaction suitability

core: nickel

mp

219-223 °C (lit.)

Quality Level

100

Application

Nickel(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate) (Ni(TMHD)₂) can be used as:

A precursor in the synthesis of nickel thin films via atomic layer deposition (ALD), which are used in solar cells, microelectronics and catalysis applications.
Metal precursor to for preparation of Ni-based catalysts via Atomic Layer Deposition.

General description

Nickel(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate) [Ni(TMHD)₂] is a green crystalline solid that exhibits moderate volatility and good thermal stability, making it effective for use in vapor-phase processes. The bulky TMHD ligands enhance its volatility while maintaining thermal stability, making it suitable for chemical vapor deposition (CVD) and atomic layer deposition (ALD). These properties enable the controlled deposition of thin, uniform layers of nickel or nickel oxide on complex surfaces. Additionally, its solubility in organic solvents supports solution-based processing techniques. Its well-defined decomposition behaviour ensures clean film formation with minimal impurities, which is essential for electronic, catalytic, and energy-storage applications.