523771
四甲基硅烷
electronic grade, ≥99.99% trace metals basis
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关于此项目
线性分子式:
Si(CH3)4
化学文摘社编号:
分子量:
88.22
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
EC Number:
200-899-1
Beilstein/REAXYS Number:
1696908
MDL number:
grade
electronic grade
vapor pressure
11.66 psi ( 20 °C)
assay
≥99.99% trace metals basis
autoignition temp.
842 °F
refractive index
n20/D 1.358 (lit.)
bp
26-28 °C (lit.)
mp
−99 °C (lit.)
density
0.648 g/mL at 25 °C (lit.)
storage temp.
2-8°C
SMILES string
C[Si](C)(C)C
InChI
1S/C4H12Si/c1-5(2,3)4/h1-4H3
InChI key
CZDYPVPMEAXLPK-UHFFFAOYSA-N
General description
Atomic number of base material: 14 Silicon
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The decomposition of trimethylsilane and tetramethylsilane has been investigated for the first time, using hot wire (catalytic) at various temperatures. Trimethylsilane is catalytic-dissociated in these species SiH(2), CH(3)SiH, CH(3), CH(2)Si. Time of flight mass spectroscopy signal of these species are
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 523771-100ML | 04061838147554 |