663301
三甲基铝
packaged for use in deposition systems
别名:
TMA, 三甲基铝
选择尺寸
关于此项目
蒸汽压
69.3 mmHg ( 60 °C)
质量水平
描述
heat of vaporization: ~41.9 kJ/mol (Dimer)
表单
liquid
反应适用性
core: aluminum
沸点
125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg
mp
15 °C (lit.)
密度
0.752 g/mL at 25 °C (lit.)
SMILES字符串
C[Al](C)C
InChI
1S/3CH3.Al/h3*1H3;
InChI key
JLTRXTDYQLMHGR-UHFFFAOYSA-N
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一般描述
警示用语:
Danger
危险声明
危险分类
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
补充剂危害
储存分类代码
4.2 - Pyrophoric and self-heating hazardous materials
WGK
nwg
闪点(°F)
No data available
闪点(°C)
No data available
个人防护装备
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
法规信息
Which document(s) contains shelf-life or expiration date information for a given product?
If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.
How do I get lot-specific information or a Certificate of Analysis?
The lot specific COA document can be found by entering the lot number above under the "Documents" section.
How do I find price and availability?
There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote. USA customers: 1-800-325-3010 or view local office numbers.
What is the Department of Transportation shipping information for this product?
Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product.
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商品
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.
Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
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