选择尺寸
关于此项目
vapor density
5.86 (vs air)
Quality Level
vapor pressure
420 mmHg ( 37.7 °C)
assay
99.998% trace metals basis
form
liquid
reaction suitability
core: silicon
bp
57.6 °C (lit.)
mp
−70 °C (lit.)
density
1.483 g/mL at 25 °C (lit.)
SMILES string
Cl[Si](Cl)(Cl)Cl
InChI
1S/Cl4Si/c1-5(2,3)4
InChI key
FDNAPBUWERUEDA-UHFFFAOYSA-N
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General description
Application
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3
target_organs
Respiratory system
supp_hazards
存储类别
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles
法规信息
此项目有
商品
High Purity Metalorganic Precursors for CPV Device Fabrication
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 688509-25ML | 04061838148100 |
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