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Merck
CN

736007

三异丙氧基氧化钒(V)

packaged for use in deposition systems

别名:

VTIP, 三异丙氧基氧化钒, 氧化三异丙醇钒

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关于此项目

线性分子式:
OV(OCH(CH3)2)3
化学文摘社编号:
分子量:
244.20
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
EC Number:
226-997-4
MDL number:
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Quality Level

form

liquid

composition

V, 20.3-21.4% titration (, by potassium permanganate)

reaction suitability

core: vanadium

refractive index

n20/D 1.479 (lit.)

bp

80-82 °C/2 mmHg (lit.)

density

1.035 g/mL at 25 °C (lit.)

SMILES string

CC(C)O[V](=O)(OC(C)C)OC(C)C

InChI

1S/3C3H7O.O.V/c3*1-3(2)4;;/h3*3H,1-2H3;;/q3*-1;;+3

InChI key

DSGGJXAUQHKOGQ-UHFFFAOYSA-N



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pictograms

FlameExclamation mark

signalword

Warning

Hazard Classifications

Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

存储类别

3 - Flammable liquids

wgk

WGK 3

flash_point_f

113.0 °F - closed cup

flash_point_c

45 °C - closed cup

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Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.


Colm Glynn et al.
Nanoscale, 7(47), 20227-20237 (2015-11-18)
Devices composed of transparent materials, particularly those utilizing metal oxides, are of significant interest due to increased demand from industry for higher fidelity transparent thin film transistors, photovoltaics and a myriad of other optoelectronic devices and optics that require more



全球贸易项目编号

货号GTIN
736007-25G04061833607732