749036
铝
sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.9995% trace metals basis
登录并加购，请在购物车里查看协议价、货期和发货地。
选择规格
变更视图
关于此项目
线性分子式:
Al
化学文摘社编号:
分子量:
26.98
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12141702
EC Number:
231-072-3
MDL number:
eCl@ss:
38120301
assay
99.9995% trace metals basis
form
pellets
autoignition temp.
1400 °F
reaction suitability
core: aluminum
resistivity
2.6548 μΩ-cm
diam. × thickness
3.00 in. × 0.125 in.
bp
2460 °C (lit.)
mp
660.37 °C (lit.)
density
2.7 g/mL at 25 °C (lit.)
SMILES string
[Al]
InChI
1S/Al
InChI key
XAGFODPZIPBFFR-UHFFFAOYSA-N
Application
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.
警示词
Danger
危险代码
存储类别
4.3 - Hazardous materials which set free flammable gases upon contact with water
怎么回事？
nwg
闪点 (F)
Not applicable
闪点 (°C)
Not applicable
Hazard Classifications
Flam. Sol. 1 - Water-react. 2