蒸汽密度
7.2 (vs air)
质量水平
蒸汽压
<1 mmHg ( 20 °C)
方案
≥99.5% (GC)
表单
liquid
折射率
n20/D 1.382 (lit.)
沸点
168 °C (lit.)
密度
0.933 g/mL at 20 °C (lit.)
SMILES字符串
CCO[Si](OCC)(OCC)OCC
InChI
1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3
InChI key
BOTDANWDWHJENH-UHFFFAOYSA-N
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应用
将与十二胺相互作用形成 H+-麦烃硅钠石的插层化合物，并用于混合金属生物活性玻璃的研究。
常用作制备干凝胶的前体
Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:
The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
- Si oxide
- Oxycarbide
- Doped silicate
- Silanol
- Siloxane polymer
- Organosilicon thin films
The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
警示用语：
Warning
危险分类
Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3
靶器官
Respiratory system
储存分类代码
3 - Flammable liquids
WGK
WGK 1
闪点(°F)
113.0 °F - closed cup
闪点(°C)
45 °C - closed cup
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