759414
原硅酸四乙酯
packaged for use in deposition systems
别名:
原硅酸四乙酯, 四乙氧基硅烷, 硅酸四乙酯, TEOS
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关于此项目
线性分子式:
Si(OC2H5)4
化学文摘社编号:
分子量:
208.33
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
EC Number:
201-083-8
Beilstein/REAXYS Number:
1422225
MDL number:
vapor density
7.2 (vs air)
Quality Segment
vapor pressure
<1 mmHg ( 20 °C)
assay
≥99.5% (GC)
form
liquid
refractive index
n20/D 1.382 (lit.)
bp
168 °C (lit.)
density
0.933 g/mL at 20 °C (lit.)
SMILES string
CCO[Si](OCC)(OCC)OCC
InChI
1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3
InChI key
BOTDANWDWHJENH-UHFFFAOYSA-N
Application
将与十二胺相互作用形成 H+-麦烃硅钠石的插层化合物，并用于混合金属生物活性玻璃的研究。
常用作制备干凝胶的前体
Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:
The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
- Si oxide
- Oxycarbide
- Doped silicate
- Silanol
- Siloxane polymer
- Organosilicon thin films
The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
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signalword
Warning
hcodes
Hazard Classifications
Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3
target_organs
Respiratory system
存储类别
3 - Flammable liquids
wgk
WGK 1
flash_point_f
113.0 °F - closed cup
flash_point_c
45 °C - closed cup