产品名称
二茂铁, 98%
InChI
1S/2C5H5.Fe/c2*1-2-4-5-3-1;/h2*1-5H;
InChI key
DFRHTHSZMBROSH-UHFFFAOYSA-N
SMILES string
[Fe].[CH]1[CH][CH][CH][CH]1.[CH]2[CH][CH][CH][CH]2
vapor pressure
0.03 mmHg ( 40 °C)
assay
98%
reaction suitability
core: iron
reagent type: catalyst
bp
249 °C (lit.)
mp
172-174 °C (lit.)
λmax
358 nm
storage temp.
2-8°C
Quality Level
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Application
二茂铁（二环戊二烯基铁）可用于：
- 用作不对称催化中的手性配体支架。
- 染料敏化太阳能电池应用中的二茂铁基电解质。
- 合成不对称二茂铁配体，可用作交叉偶联、氢化、烯丙基取代的催化剂。
- 通过化学气相沉积法合成二维六方有序介孔碳（CMK-5），用作甲醇氧化的催化剂载体。
- 合成二茂铁与富勒烯的分子杂化物（巴基二茂铁）。
- 制备二茂铁盐，用作温和氧化剂。
signalword
Danger
Hazard Classifications
Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 1 - Flam. Sol. 1 - Repr. 1B - STOT RE 2 Inhalation
target_organs
Liver
存储类别
4.1B - Flammable solid hazardous materials
wgk
WGK 2
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Gloves, type P3 (EN 143) respirator cartridges
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Thin solid films consisting of ZrO
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ACS omega, 3(9), 12106-12113 (2018-10-16)
1H-1,2,3-Triazole tethered imidazole-isatin and imidazole-isatin-thiosemicarbazone conjugates were synthesized and evaluated against MCF-7 and MDA-MB-231 cell lines. Antiproliferative activities of the synthesized conjugates revealed an optimum combination of longer alkyl chain length as spacer and a halogen-substituent on the isatin ring
The syntheses and catalytic applications of unsymmetrical ferrocene ligands
Atkinson RCJ, et al.
Chemical Society Reviews, 33(33), 313-328 (2004)
Muneebah Adams et al.
Dalton transactions (Cambridge, England : 2003), 42(13), 4677-4685 (2013-01-31)
A series of aryl-functionalized and ferrocenyl monothiosemicarbazone compounds (L1-L4) were synthesized in moderate yields via a general Schiff-base condensation reaction. The thiosemicarbazone (TSC) ligands were reacted with the ruthenium dimer [Ru(Ar)(μ-Cl)Cl](2) (Ar = benzene; p-cymene) to yield a series of
Hybrid of ferrocene and fullerene
Sawamura M, et al.
Journal of the American Chemical Society, 32(124), 9354-9355 (2002)
商品
Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.
近十年来出现了原子层沉积（ALD）技术以满足各种需求，包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。
我们的科学家团队拥有各种研究领域经验，包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
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