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Merck
CN

251518

Sigma-Aldrich

Tributyltin ethoxide

97%

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About This Item

Linear Formula:
[CH3(CH2)3]3SnOC2H5
CAS Number:
682-00-8
Molecular Weight:
335.11
MDL number:
MFCD00009873
UNSPSC Code:
12352103
PubChem Substance ID:
24855136

Key Documents

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Assay

97%

refractive index

n20/D 1.467 (lit.)

bp

92 °C/0.1 mmHg (lit.)

density

1.098 g/mL at 25 °C (lit.)

SMILES string

CCCC[Sn](CCCC)(CCCC)OCC

InChI

1S/3C4H9.C2H5O.Sn/c3*1-3-4-2;1-2-3;/h3*1,3-4H2,2H3;2H2,1H3;/q;;;-1;+1

InChI key

SDTAGBUVRXOKAK-UHFFFAOYSA-N

Signal Word

Danger

Hazard Classifications

Acute Tox. 3 Oral - Acute Tox. 4 Dermal - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT RE 1

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

104.0 °F - closed cup

Flash Point(C)

40 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

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Certificates of Analysis (COA)

Lot/Batch Number
12020CS
01025DY
00222KP
00110CB

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Charith E Nanayakkara et al.
Langmuir : the ACS journal of surfaces and colloids, 33(24), 5998-6004 (2017-05-24)
Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting electrodes. Thermal atomic layer deposition (ALD) is often best suited for these applications, but its implementation requires a mechanistic

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