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Merck
CN

289388

Silicon tetrachloride

99.998% trace metals basis

Synonym(s):

STC, Tetrachlorosilane

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About This Item

Linear Formula:
SiCl4
CAS Number:
10026-04-7
Molecular Weight:
169.90
NACRES:
NA.23
PubChem Substance ID:
24857194
UNSPSC Code:
12352103
EC Number:
233-054-0
MDL number:
MFCD00011229

Key Documents

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InChI key

FDNAPBUWERUEDA-UHFFFAOYSA-N

InChI

1S/Cl4Si/c1-5(2,3)4

SMILES string

Cl[Si](Cl)(Cl)Cl

vapor density

5.86 (vs air)

vapor pressure

420 mmHg ( 37.7 °C)

assay

99.998% trace metals basis

form

liquid

reaction suitability

core: silicon

bp

57.6 °C (lit.)

mp

−70 °C (lit.)

density

1.483 g/mL at 25 °C (lit.)

Quality Level

200

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General description

Silicon tetrachloride is a highly reactive and volatile inorganic compound widely utilized as a precursor in both solution-based and vapor-phase deposition processes. It plays a critical role in the synthesis of high-purity silicon-based materials such as silicon dioxide (SiO2) and silicon nitride (Si₃N₄), which are essential in a broad range of high-performance applications such as semiconductor industry, optics and photonics. Additionally, it is also used in the manufacture of high-purity silica glass, advanced ceramics, and energy storage components.

Application

Silicon tetrachloride can be used:
  • A precursor in the chemical vapor deposition (CVD) process to deposit silicon onto graphite substrates. This approach results development of high-performance anodes for lithium-ion batteries.
  • A precursor material in the hydrogen thermal plasma (H-plasma) process to synthesize silicon nanospheres, which are suitable for use as anode materials in lithium-ion batteries.

Features and Benefits

Silicon tetrachloride exhibits:
  • High Purity (99.998%): Ensures minimal contamination, crucial for optics and photonics applications
  • Ideal for Semiconductor applications: Its ultra-high purity supports fabrication of advanced integrated circuits, wafers, and solar cells

pictograms

Skull and crossbonesCorrosion
GHS06,GHS05

signalword

Danger

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3

target_organs

Respiratory system

supp_hazards

EUH014,EUH071

Storage Class

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

wgk

WGK 1

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles

Regulatory Information

危险化学品
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Certificates of Analysis (COA)

Lot/Batch Number
SHBK4428
SHBJ0715
SHBH0583V
SHBF2521V
SHBG2090V

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An efficient and closed-loop approach to convert silicon tetrachloride to silicon nanospheres anode materials via hydrogen thermal plasma
Yang, Zongxian and Dong,et al.
Materials Research Bulletin, 175, 112765-112765 (2024)
High-performance silicon/graphite anode prepared by CVD using SiCl4 as precursor for Li-ion batteries
Hu, Mengfei and Wu, Houzheng and Zhang, Guo-Jun
Chemical Physics Letters, 833, 140917-140917 (2023)
Sang Ho Lee et al.
Journal of the American Chemical Society, 127(25), 9071-9078 (2005-06-23)
A series of four asymmetrically aryl-substituted 9,9'-spiro-9-silabifluorene (SSF) derivatives, 2,2'-di-tert-butyl-7,7'-diphenyl-9,9'-spiro-9-silabifluorene (PhSSF), 2,2'-di-tert-butyl-7,7'-dipyridin-2-yl-9,9'-spiro-9-silabifluorene (PySSF), 2,2'-di-tert-butyl-7,7'-dibiphenyl-4-yl-9,9'-spiro-9-silabifluorene (BPhSSF), and 2,2'-di-tert-butyl-7,7'-bis(2',2' '-bipyridin-6-yl)-9,9'-spiro-9-silabifluorene (BPySSF) are prepared through the cyclization of the corresponding 2,2'-dilithiobiphenyls with silicon tetrachloride. These novel spiro-linked silacyclopentadienes (siloles) form transparent and stable
Baker Jawabrah Al-Hourani et al.
Bioorganic & medicinal chemistry letters, 22(6), 2235-2238 (2012-02-22)
A series of novel 5-substituted 1H-tetrazoles as cyclooxygenase-2 (COX-2) inhibitors was prepared via treatment of various diaryl amides with tetrachlorosilane/sodium azide. All compounds were tested in cyclooxygenase (COX) assays in vitro to determine COX-1 and COX-2 inhibitory potency and selectivity.
C Schulze Isfort et al.
Toxicology letters, 186(3), 148-151 (2008-12-31)
Synthetic nanoscaled metal oxides are mainly produced by pyrogenic decomposition of precursors in the gas phase using a hot-wall or plasma reactor. Due to their low production rate and limited scalability, these processes are of minor technical relevance in manufacturing
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