Skip to Content
Merck
CN

339180

Germanium(IV) ethoxide

≥99.95% trace metals basis

Synonym(s):

Tetraethoxygermanium

Sign In to View Organizational & Contract Pricing

Select a Size

About This Item

Linear Formula:
Ge(OC2H5)4
CAS Number:
14165-55-0
Molecular Weight:
252.88
Beilstein:
3661173
EC Number:
238-007-8
MDL number:
MFCD00015121
UNSPSC Code:
12352103
PubChem Substance ID:
24860619
NACRES:
NA.23

Key Documents

View All Documentation
Technical Service
Need help? Our team of experienced scientists is here for you.
Let Us Assist
Technical Service
Need help? Our team of experienced scientists is here for you.
Let Us Assist

Assay

≥99.95% trace metals basis

form

liquid

reaction suitability

core: germanium
reagent type: catalyst

impurities

≤0.01% Si

refractive index

n20/D 1.407 (lit.)

density

1.14 g/mL at 25 °C (lit.)

SMILES string

CCO[Ge](OCC)(OCC)OCC

InChI

1S/C8H20GeO4/c1-5-10-9(11-6-2,12-7-3)13-8-4/h5-8H2,1-4H3

InChI key

GXMNGLIMQIPFEB-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

General description

Germanium(IV) ethoxide is a high-purity, colorless to pale yellow liquid organometallic compound with a trace metal purity of ≥99.95%. It is widely used as a catalyst and a precursor for solution-based and vapor-phase deposition processes, such as sol-gel synthesis, chemical vapor deposition (CVD), and atomic layer deposition (ALD). Its excellent volatility, reactivity, and metal-organic composition make it suitable for producing high-quality germanium-containing films, coatings, and nanostructures in electronics, optics, and semiconductor industries.

Application

Germanium(IV) ethoxide can be used as:
  • A precursor in the synthesis of germanium oxide nanostructures via photonic curing.
  • A key dopant precursor in the synthesis of Ge-doped hematite photoanodes for enhancing charge separation efficiency in photoelectrochemical water splitting.
  • A germanium source to synthesize the bismuth germanate via the sol-gel process, to develop uniform thin films suitable for advanced applications.

Other Notes

Contains toluene

Pictograms

FlameExclamation mark
GHS02,GHS07

Signal Word

Warning

Hazard Statements

H226,H315,H319,H335

Hazard Classifications

Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT SE 3

Target Organs

Respiratory system

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

120.0 °F - closed cup

Flash Point(C)

48.9 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

危险化学品
This item has

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
MKCX5603
MKCW8458
MKCV9820
MKCT8486
MKCT3078

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Mat. Res. Soc. Symp. Proc., 73, 443-443 (1986)
Synthesis of Silicon and Germanium Oxide Nanostructures via Photonic Curing; a Facile Approach to Scale Up Fabrication
Khatoon, Najma and Subedi, et al.
ChemistryOpen, 13, e202300260-e202300260 (2014)
Ideal dopant to increase charge separation efficiency in hematite photoanodes: germanium
de Matos Rodrigues, et al.
Journal of Materials Chemistry, 10, 13456-13466 (2022)
Sol-gel processing of bismuth germanate thin-films
Secu, Mihail and Secu, et al.
Coatings, 10, 255-255 (2020)
Non-Cryst. Solids, 168, 195-195 (1994)

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service