40289
Acetone
Synonym(s):
Dimethyl ketone
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About This Item
Linear Formula:
CH3COCH3
CAS Number:
Molecular Weight:
58.08
UNSPSC Code:
12352115
PubChem Substance ID:
eCl@ss:
39021201
EC Number:
200-662-2
Beilstein/REAXYS Number:
635680
MDL number:
Vapor pressure:
184 mmHg ( 20 °C)
InChI key
CSCPPACGZOOCGX-UHFFFAOYSA-N
InChI
1S/C3H6O/c1-3(2)4/h1-2H3
SMILES string
CC(C)=O
vapor pressure
184 mmHg ( 20 °C)
CofA
specification on request
expl. lim.
13.2 %
color
clear colorless
mp
−94 °C (lit.)
density
0.791 g/mL at 25 °C (lit.)
format
neat
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Application
Acetone′s luminesence intensity is dependent upon the solution components . The absorption of UV light by acetone, results in its photolysis and the production of radials .
Semiconductor grade acetone may be used for cleaning of the surfaces, such as;
The semiconductor grade acetone was also used in a comparative study for observing the effect of various solvents on nitrogen containing promoters (NCPs), which is used in oxidation reaction of 5-hydroxymethylfurfural.
- Hydrogen terminated silicon wafer.
- SiC wafers.
- Chromium nitride epilayer on silicon wafer.
The semiconductor grade acetone was also used in a comparative study for observing the effect of various solvents on nitrogen containing promoters (NCPs), which is used in oxidation reaction of 5-hydroxymethylfurfural.
signalword
Danger
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 2 - STOT SE 3
target_organs
Central nervous system
supp_hazards
Storage Class
3 - Flammable liquids
wgk
WGK 1
flash_point_f
1.4 °F - closed cup
flash_point_c
-17.0 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves
Regulatory Information
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Cu catalyzed oxidation of 5-hydroxymethylfurfural to 2, 5-diformylfuran and 2, 5-furandicarboxylic acid under benign reaction conditions.
Hansen T, et al.
Applied Catalysis A: General, 456, 44-50 (2013)
Covalently attached organic monolayers onto silicon carbide from 1-alkynes: molecular structure and tribological properties.
Pujari S, et al.
Langmuir, 29(13), 4019-4031 (2013)
Mono-fluorinated alkyne-derived SAMs on oxide-free Si (111) surfaces: preparation, characterization and tuning of the Si workfunction
Pujari S, et al.
Langmuir, 29(2), 570-580 (2013)
Hexadecadienyl monolayers on hydrogen-terminated Si (111): faster monolayer formation and improved surface coverage using the enyne moiety
Rijksen B, et al.
Langmuir, 28(16), 6577-6588 (2012)
Organic monolayers from 1-alkynes covalently attached to chromium nitride: alkyl and fluoroalkyl termination.
Pujari S, et al.
Langmuir, 29(33), 10393-10404 (2013)
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