408964
Cyclohexyl methacrylate
≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor
Synonym(s):
Methacrylic acid cyclohexyl ester
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About This Item
Linear Formula:
CH2=C(CH3)COOC6H11
CAS Number:
Molecular Weight:
168.23
Beilstein:
2045235
EC Number:
MDL number:
UNSPSC Code:
12162002
PubChem Substance ID:
NACRES:
NA.23
Quality Level
Assay
≥97%
form
liquid
contains
~60 ppm monomethyl ether hydroquinone as inhibitor
refractive index
n20/D 1.458 (lit.)
bp
68-70 °C/4 mmHg (lit.)
density
0.964 g/mL at 25 °C (lit.)
SMILES string
CC(=C)C(=O)OC1CCCCC1
InChI
1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3
InChI key
OIWOHHBRDFKZNC-UHFFFAOYSA-N
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General description
Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.
Application
Cyclohexyl methacrylate can be used:
- As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
- As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
- As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.
Signal Word
Warning
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3
Target Organs
Respiratory system
Storage Class Code
10 - Combustible liquids
WGK
WGK 1
Flash Point(F)
181.4 °F
Flash Point(C)
83 °C
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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High-Performance Luminescent Solar Concentrators Based on Poly (Cyclohexylmethacrylate)(PCHMA) Films
Francisco Jos'e Ostos, et al.
Polymers, 12, 2898-2898 (2020)
Azeotropic Binary Solvent System Containing Nonfluorinated Polymer-Grafted Silica Nanoparticles for the Fabrication of a Superhydrophobic Surface
Kai-Yen Chin, et al.
Langmuir, 39, 9841-9849 (2023)
Fabrication of light emitting diodes using photo-patternable quantum dot-acrylate resins
Kab Pil Yang, et al.
Journal of Materials Chemistry, 9, 17084-17088 (2021)
Florian Jakobs et al.
Materials (Basel, Switzerland), 13(8) (2020-04-29)
For most kinds of active polymer optical fibers, a homogeneous distribution of dye molecules over the entire fiber length and cross section is required. In this study, chemical bonding of dyes to poly(methyl methacrylate) (PMMA) by copolymerization is achieved within
Kai Kan et al.
Nanoscale research letters, 15(1), 51-51 (2020-03-04)
A characteristic effect of a nano-concave-convex structure of a zirconia nanoparticle assembly with an inherent porous structure and huge surface area enabled us to introduce systematic surface modification by thermal treatment to smooth surface and polymer impregnation to mask the
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