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About This Item
Empirical Formula (Hill Notation):
C44H76O12Si8
CAS Number:
Molecular Weight:
1021.75
MDL number:
UNSPSC Code:
12162002
PubChem Substance ID:
SMILES string
C1CCC(C1)[Si]23O[Si]6(CCC4C[C@H]5C[C@@H]4C=C5)O[Si]7(O[Si](O2)(O[Si]8(O[Si](O3)(O[Si](O6)(O[Si](O7)(O8)C9CCCC9)C%10CCCC%10)C%11CCCC%11)C%12CCCC%12)C%13CCCC%13)C%14CCCC%14
Application
Polyhedral oligomeric silsesquioxane (POSS) monomer, useful as model for silica surfaces, and for the formation of novel polymeric materials.
Features and Benefits
Polyhedral oligomeric silsesquioxane (POSS) monomer, useful as model for silica surfaces, and for the formation of novel polymeric materials.
Legal Information
POSS is a registered trademark of Hybrid Plastics, Inc.
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