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Merck
CN

496863

Pentakis(dimethylamino)tantalum(V)

99.99%

Synonym(s):

PDMAT, TADMA, Ta(NMe2)5, Tantalum dimethylamide

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About This Item

Linear Formula:
Ta(N(CH3)2)5
CAS Number:
19824-59-0
Molecular Weight:
401.33
NACRES:
NA.23
PubChem Substance ID:
24873088
UNSPSC Code:
12352103
MDL number:
MFCD01631286

Key Documents

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InChI

1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5

SMILES string

CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C

InChI key

VSLPMIMVDUOYFW-UHFFFAOYSA-N

assay

99.99%

Quality Level

100

reaction suitability

core: tantalum, reagent type: catalyst

mp

100 °C (dec.) (lit.)

Related Categories

General description

Atomic number of base material: 73 Tantalum

Features and Benefits

Volatile solid CVD precursor to tantalum nitride (TaN) thin films. Also yields tantalum oxide (Ta2O5) thin films when O2, H2O, NO or H2O2 is present during the deposition process. Ta2O5 thins films show promise as gate dielectric materials in the manufacture of integrated circuits.

pictograms

FlameCorrosion
GHS02,GHS05

signalword

Danger

Storage Class

4.3 - Hazardous materials which set free flammable gases upon contact with water

wgk

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges

Hazard Classifications

Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react. 1

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Certificates of Analysis (COA)

Lot/Batch Number
SHBP9453
SHBG7719V
SHBC8197V
SHBB0436V
29796BP

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James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume

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