496863
Pentakis(dimethylamino)tantalum(V)
99.99%
Synonym(s):
PDMAT, TADMA, Ta(NMe2)5, Tantalum dimethylamide
Sign In to View Organizational & Contract Pricing.
Select a Size
Change View
About This Item
Linear Formula:
Ta(N(CH3)2)5
CAS Number:
Molecular Weight:
401.33
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
assay
99.99%
reaction suitability
core: tantalum, reagent type: catalyst
mp
100 °C (dec.) (lit.)
SMILES string
CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C
InChI
1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5
InChI key
VSLPMIMVDUOYFW-UHFFFAOYSA-N
General description
Atomic number of base material: 73 Tantalum
Features and Benefits
Volatile solid CVD precursor to tantalum nitride (TaN) thin films. Also yields tantalum oxide (Ta2O5) thin films when O2, H2O, NO or H2O2 is present during the deposition process. Ta2O5 thins films show promise as gate dielectric materials in the manufacture of integrated circuits.
signalword
Danger
hcodes
Storage Class
4.3 - Hazardous materials which set free flammable gases upon contact with water
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
Hazard Classifications
Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react. 1
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Articles
High Purity Metalorganic Precursors for CPV Device Fabrication
James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume
Global Trade Item Number
| SKU | GTIN |
|---|---|
| 496863-5G | 04061833598764 |