648663
Bis(ethylcyclopentadienyl)ruthenium(II)
Synonym(s):
Diethylruthenocene
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About This Item
Linear Formula:
C7H9RuC7H9
CAS Number:
Molecular Weight:
287.36
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
Quality Segment
form
liquid
composition
Ru, 33.9-36.4% gravimetric
reaction suitability
core: ruthenium, reagent type: catalyst
refractive index
n20/D 1.5870 (lit.)
bp
100 °C/0.01 mmHg (lit.)
mp
6 °C (lit.)
density
1.3412 g/mL at 25 °C (lit.)
storage temp.
−20°C
SMILES string
[Ru].CC[C]1[CH][CH][CH][CH]1.CC[C]2[CH][CH][CH][CH]2
InChI
1S/2C7H9.Ru/c2*1-2-7-5-3-4-6-7;/h2*3-6H,2H2,1H3;
InChI key
VLTZUJBHIUUHIK-UHFFFAOYSA-N
General description
Bis(ethylcyclopentadienyl)ruthenium(II) is a organometallic compound widely used as a catalyst and as a precursor for thin-film deposition. It is valued for its high thermal stability, volatility, and efficiency in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes to create high-purity ruthenium and ruthenium oxide films. This compound plays a crucial role in microelectronics, catalysis, and energy materials.
Application
Bis(ethylcyclopentadienyl)ruthenium can be used:
- A precursor to synthesize ruthenium films via the atomic layer deposition (ALD) method.
- A precursor to synthesize ruthenium thin films on substrates such as SiO2 via plasma enhanced atomic layer deposition (PEALD) method.
- A metal-organic precursor in the chemical vapor deposition (CVD) process to deposit ruthenium (Ru) thin films suitable for applications like capacitor electrodes in microelectronics.
- A precursor to prepare ultrathin ruthenium (Ru) films via the atomic layer deposition (ALD) and selective etching techniques.
Features and Benefits
Bis(ethylcyclopentadienyl)ruthenium(II) exhibits:
- High Volatility: Suitable for gas-phase delivery in Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).
- Thermal Stability: Stable under typical ALD/CVD processing temperatures
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signalword
Warning
hcodes
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
target_organs
Respiratory system
Storage Class
10 - Combustible liquids
wgk
WGK 3
flash_point_f
>199.9 °F - closed cup
flash_point_c
> 93.3 °C - closed cup
ppe
Eyeshields, Gloves, type ABEK (EN14387) respirator filter
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