Skip to Content
Merck
CN

648663

Bis(ethylcyclopentadienyl)ruthenium(II)

Synonym(s):

Diethylruthenocene

Sign In to View Organizational & Contract Pricing.

Select a Size

Change View

About This Item

Linear Formula:
C7H9RuC7H9
CAS Number:
Molecular Weight:
287.36
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
Technical Service
Need help? Our team of experienced scientists is here for you.
Let Us Assist


Quality Segment

form

liquid

composition

Ru, 33.9-36.4% gravimetric

reaction suitability

core: ruthenium, reagent type: catalyst

refractive index

n20/D 1.5870 (lit.)

bp

100 °C/0.01 mmHg (lit.)

mp

6 °C (lit.)

density

1.3412 g/mL at 25 °C (lit.)

storage temp.

−20°C

SMILES string

[Ru].CC[C]1[CH][CH][CH][CH]1.CC[C]2[CH][CH][CH][CH]2

InChI

1S/2C7H9.Ru/c2*1-2-7-5-3-4-6-7;/h2*3-6H,2H2,1H3;

InChI key

VLTZUJBHIUUHIK-UHFFFAOYSA-N

General description

Bis(ethylcyclopentadienyl)ruthenium(II) is a organometallic compound widely used as a catalyst and as a precursor for thin-film deposition. It is valued for its high thermal stability, volatility, and efficiency in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes to create high-purity ruthenium and ruthenium oxide films. This compound plays a crucial role in microelectronics, catalysis, and energy materials.

Application

Bis(ethylcyclopentadienyl)ruthenium can be used:
  • A precursor to synthesize ruthenium films via the atomic layer deposition (ALD) method.
  • A precursor to synthesize ruthenium thin films on substrates such as SiO2 via plasma enhanced atomic layer deposition (PEALD) method.
  • A metal-organic precursor in the chemical vapor deposition (CVD) process to deposit ruthenium (Ru) thin films suitable for applications like capacitor electrodes in microelectronics.
  • A precursor to prepare ultrathin ruthenium (Ru) films via the atomic layer deposition (ALD) and selective etching techniques.

Features and Benefits

Bis(ethylcyclopentadienyl)ruthenium(II) exhibits:
  • High Volatility: Suitable for gas-phase delivery in Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).
  • Thermal Stability: Stable under typical ALD/CVD processing temperatures


Still not finding the right product?


pictograms

Exclamation mark

signalword

Warning

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

Storage Class

10 - Combustible liquids

wgk

WGK 3

flash_point_f

>199.9 °F - closed cup

flash_point_c

> 93.3 °C - closed cup

ppe

Eyeshields, Gloves, type ABEK (EN14387) respirator filter



Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library