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Merck
CN

651796

Sigma-Aldrich

Negative photoresist I

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About This Item

CAS Number:
9003-31-0
MDL number:
MFCD00084438
UNSPSC Code:
41116107
NACRES:
NA.23

Key Documents

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mol wt

average Mw 60,000-70,000 (polyisoprene)

Quality Level

100

composition

solids, 27-29 wt. %

dielectric constant

2.4

surface tension

29.2 dyn/cm

viscosity

465-535 cP(25 °C)

bp

122-142 °C (lit.)

density

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

storage temp.

2-8°C

SMILES string

O1C(OCC(C1)(C)C)CCCCCCCC

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChI key

UBZVSDZJBLSIJG-UHFFFAOYSA-N

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General description

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

Signal Word

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

Target Organs

Respiratory system

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

75.2 °F - closed cup

Flash Point(C)

24 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

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Certificates of Analysis (COA)

Lot/Batch Number
MKCK5970
MKCJ2028
MKCG8986
MKCJ0922
MKCF2182

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

  3. At what wavelength does Product 651796, Negative photoresist, have absorbance?

    This product has a spectral absorbance range of 310-480nm. The peak spectral sensitivity is around 355nm.

  4. How should Product 651796, Negative photoresist, be stored?

    It should be refrigerated to inhibit polymerization and warmed to room temperature before opening.  It should also be stored away from light sources and kept in the sealed bottle.

  5. How do I use Product 651796, Negative photoresist?

    Please refer to technical bulletin AL-217 for detailed procedures.

  6. When using Product 651796, Negative photoresist, how do I remove the photoresist film?  

    Hot chlorinated hydrocarbons such as those in Product No. 651761, Negative Resist Remover I, swell the photoresist, which effectively removes the resist film.  The ideal temperature at which to use the remover is 50-60°C.

  7. How do I find price and availability?

    There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers.

  8. What is the Department of Transportation shipping information for this product?

    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  9. My question is not addressed here, how can I contact Technical Service for assistance?

    Ask a Scientist here.

Chandy Kim et al.
Journal of chromatography. A, 1213(2), 181-188 (2008-11-11)
Natural and synthetic poly(cis-1,4-isoprene) were characterized by size-exclusion chromatography coupled with an online multi-angle light scattering detector (SEC-MALS). Unlike synthetic poly(cis-1,4-isoprene) (SR), natural rubber (NR) samples showed anomalous elution profiles. The beginning of elution was very similar to SR but
Maren Krack et al.
Journal of the American Chemical Society, 130(23), 7315-7320 (2008-05-20)
Magnetic nanoparticles have been assembled into the bilayer membrane of block copolymer vesicles. The nanoparticles decorate the hydrophobic/hydrophilic interface, which leads to bridging of adjacent bilayers and the formation of oligo-lamellar vesicles. The nanoparticle uptake of the vesicles is sufficiently
Shinya Takeno et al.
Bioscience, biotechnology, and biochemistry, 74(1), 13-17 (2010-01-09)
Natural polyisoprene is a biopolymer consisting of isoprene units (C(5)H(8)) that is used commercially in household, medical, and industrial materials. For the management of natural polyisoprene production, the selection of high-yield polyisoprene-producing trees, and an understanding of polyisoprene biosynthesis, a
Carina Schulte et al.
Applied and environmental microbiology, 74(24), 7643-7653 (2008-10-28)
Gordonia westfalica Kb1 and Gordonia polyisoprenivorans VH2 induce the formation of an extracellular superoxide dismutase (SOD) during poly(cis-1,4-isoprene) degradation. To investigate the function of this enzyme in G. polyisoprenivorans VH2, the sodA gene was disrupted. The mutants exhibited reduced growth
Christopher J Ellison et al.
The journal of physical chemistry. B, 113(12), 3726-3737 (2009-08-13)
Polymeric bicontinuous microemulsions are thermodynamically stable structures typically formed by ternary blends of immiscible A and B homopolymers and a macromolecular surfactant such as an AB diblock copolymer. Investigations of these bicontinuous morphologies have largely focused on model systems in
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Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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