Chromium etchant

Name: Chromium etchant
Brand: ALDRICH

standard

Synonym(s):

Cr etching solution

Select a Size

Change View

About This Item

UNSPSC Code:

12352300

NACRES:

NA.23

MDL number:

MFCD07370678

Technical Service

Need help? Our team of experienced scientists is here for you.

Let Us Assist

Properties

grade

standard

Quality Level

100

composition

volatiles, 85%

color

orange

bp

100 °C/1 atm

density

1.16 g/mL at 25 °C

Description

General description

Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.

Appearance - Clear orange
pH - Acidic
Etch Rate at 40 °C - 40 Å/second
Etch Capacity (rate declines at ~70%) - 65 g/gallon
Shelf Life - 1 year
Storage Conditions - Ambient
Filtration - 0.2 µm
Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
Rinse - Deionized water
Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
Select Compatible Materials - Au, Ti, oxide, nitride, Si
Select Incompatible Materials - Al, Ni, Cu, NiCr
Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
Isotropy - Isotropic
Incompatible Chemicals - Strong bases

Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.

Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.

Application

The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si₃N₄, SiO₂, Ti, and W surfaces

For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.

Features and Benefits

Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.