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667447

Ceramic Etchant A

Synonym(s):

Al2O3 Etch, Aluminum Oxide Etchant, GaN Etch, Gallium Nitride Etchant, Si3N4 Etch, Silicon Nitride Etchant

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About This Item

UNSPSC Code:
12352300
NACRES:
NA.23
MDL number:
MFCD08705343
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Quality Segment

100

Application

Useful for fast and controllable etching of silicon nitride (Si3N4), galium nitride (GaN), or aluminum oxide (Al2O3).

Features and Benefits

Etch Rates @ 180 °C:
Aluminum oxide 120 Å/min
Silicon nitride 125 Å/min
Gallium nitride 80 Å/min
Silicon dioxide 1 Å/min
Silicon 1 Å/min

pictograms

CorrosionExclamation mark
GHS05,GHS07

signalword

Danger

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B

Storage Class

8B - Non-combustible corrosive hazardous materials

wgk

WGK 1

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

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