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CN

667447

Ceramic Etchant A

Synonym(s):

Al₂O₃Etch, Aluminum Oxide Etchant, GaN Etch, Gallium Nitride Etchant, Si₃N₄ Etch, Silicon Nitride Etchant

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About This Item

UNSPSC Code:

12352300

NACRES:

NA.23

MDL number:

Key Documents

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Quality Level

Related Categories

Electronic Chemicals & Etchants

Electronic Materials

Application

Useful for fast and controllable etching of silicon nitride (Si₃N₄), galium nitride (GaN), or aluminum oxide (Al₂O₃).

Features and Benefits

Etch Rates @ 180 °C:
Aluminum oxide 120 Å/min
Silicon nitride 125 Å/min
Gallium nitride 80 Å/min
Silicon dioxide 1 Å/min
Silicon 1 Å/min

pictograms

Corrosion

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signalword

Danger

hcodes

pcodes

P234 - P270 - P280 - P301 + P312 - P303 + P361 + P353 - P305 + P351 + P338

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B

Storage Class

8B - Non-combustible corrosive hazardous materials

wgk

WGK 1

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

Regulatory Information

危险化学品

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