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About This Item
assay
≥99.0% (GC), ≥99.998% trace metals basis (ICP)
form
solid
bp
205-210 °C (lit.)
mp
63-65 °C (lit.)
SMILES string
CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
InChI
1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
InChI key
HLDBBQREZCVBMA-UHFFFAOYSA-N
General description
Application
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Storage Class
11 - Combustible Solids
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Gloves, type N95 (US)
Regulatory Information
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Articles
High Purity Metalorganic Precursors for CPV Device Fabrication
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Global Trade Item Number
| SKU | GTIN |
|---|---|
| 697281-25G | 04061833607404 |