Z552208
Principles of Chemical Vapor Deposition: What′s Going on Inside the Reactor?
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About This Item
ISBN-10:
1-4020-1248-9
ISBN-13:
978-1-4020-1248-8
UNSPSC Code:
55101509
publication info
D.M. Dobkin and M.K. Zuraw, Kluwer Academic Publishers, 2003, 288 pp., hard cover
General description
Provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field.
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