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Merck
CN

01565

Hexamethyldisiloxane

LiChropur, ≥98% (GC)

Synonym(s):

HMDSO

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About This Item

Linear Formula:
(CH3)3SiOSi(CH3)3
CAS Number:
Molecular Weight:
162.38
UNSPSC Code:
41116023
NACRES:
NA.22
PubChem Substance ID:
EC Number:
203-492-7
Beilstein/REAXYS Number:
1736258
MDL number:
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grade

derivatization grade ((GC derivatization))

Quality Level

vapor density

>1 (vs air)

assay

≥98% (GC)

form

liquid

quality

LiChropur

reaction suitability

reagent type: derivatization reagent
reaction type: Silylations

technique(s)

gas chromatography (GC): suitable

refractive index

n20/D 1.377 (lit.)

bp

101 °C (lit.)

mp

−59 °C (lit.)

density

0.764 g/mL at 20 °C (lit.)

SMILES string

C[Si](C)(C)O[Si](C)(C)C

InChI

1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

InChI key

UQEAIHBTYFGYIE-UHFFFAOYSA-N

Packaging

Clear borosilicate glass, high hydrolytic resistance (Type I)

Other Notes

Discover LiChropur reagents ideal for HPLC or LC-MS analysis

Legal Information

LiChropur is a trademark of Merck KGaA, Darmstadt, Germany


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pictograms

FlameEnvironment

signalword

Danger

hcodes

Hazard Classifications

Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2

Storage Class

3 - Flammable liquids

wgk

WGK 2

flash_point_f

21.2 °F - closed cup

flash_point_c

-6 °C - closed cup

Regulatory Information

危险化学品

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Articles

Results of a study involving the ability few Fluka silylating reagents to form GC-MS-compatible trimethylsilylmethyl derivatives of NSAIDs


Vikram D Kodibagkar et al.
Magnetic resonance in medicine, 55(4), 743-748 (2006-03-01)
19F NMR spin-lattice relaxometry of hexafluorobenzene (HFB) has been shown to be a highly sensitive indicator of tumor oxygenation. In this study hexamethyldisiloxane (HMDSO) was identified as a proton NMR analog, and its potential as a probe for investigating dynamic
Tohru Hayakawa et al.
Biomaterials, 25(1), 119-127 (2003-10-29)
Plasma polymerized hexamethyldisiloxane (HMDSO) thin film was deposited onto titanium using a radio-frequency apparatus for the surface modification of titanium. A titanium disk was first polished using colloidal silica at pH=9.8. Plasma-polymerized HMDSO films were firmly attached to the titanium
Magdalena M Dudek et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 11155-11161 (2009-09-09)
The modification of cyclo-olefin polymer Zeonor by plasma-enhanced chemical vapor deposition to form a silica-like surface and evaluation of its application for lateral flow bioassays applications are discussed in this study. The SiOx layer was extensively characterized using contact angle



Global Trade Item Number

SKUGTIN
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W259411-25G-K04061837515552
W259403-SAMPLE-K04061837515545